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Record
Title
Reactive Ion Etching of Silicon using F-based chemistry - Exploring the Limits
Type
Student Paper
Publ. year
2018
Author/s
Havir, Harald
Department/s
Solid State Physics; Department of Physics
In LUP since
2018-07-04
Downloads

Total This Year This Month
683 143 8
Downloads per country

United States of America 144 (21%)
Sweden 104 (15%)
Germany 51 (8%)
Russian Federation 43 (6%)
Taiwan (China) 32 (5%)
South Korea 29 (4%)
China 26 (4%)
France 22 (3%)
India 22 (3%)
Netherlands (Kingdom of the) 17 (3%)
Hong Kong (China) 15 (2%)
Finland 15 (2%)
Singapore 14 (2%)
Czechia 14 (2%)
United Kingdom of Great Britain and Northern Ireland 14 (2%)
Denmark 11 (2%)
Belgium 9 (1%)
Unknown 9 (1%)
Japan 9 (1%)
Italy 8 (1%)
Australia 6 (1%)
Turkiye 6 (1%)
Portugal 5 (1%)
Poland 5 (1%)
Spain 4 (1%)
Canada 4 (1%)
Saudi Arabia 4 (1%)
Sri Lanka 3 (0%)
Iran 3 (0%)
Switzerland 3 (0%)
Austria 2 (0%)
Algeria 2 (0%)
Norway 2 (0%)
Mexico 2 (0%)
Kenya 2 (0%)
South Africa 2 (0%)
Slovenia 2 (0%)
Israel 2 (0%)
New Zealand 2 (0%)
Malaysia 2 (0%)
Ă…land Islands 1 (0%)
Hungary 1 (0%)
Palestinian Territory 1 (0%)
Indonesia 1 (0%)
Lebanon 1 (0%)
Romania 1 (0%)
Brazil 1 (0%)
Egypt 1 (0%)
About
The download statistics shown here have been collected since the launch of LUP in October 2007 and are updated every night. Statistics are available for all records with open access fulltexts. Efforts have been made to exclude downloads by robots and track irregular download activities.

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Disclaimer
The information on downloads per country is based on the geolocation of IP addresses and may not be completely accurate. The statistics presented here may also change retroactively when the calculation process is improved to provide more accurate results.

Statistics Last Updated
Sun Oct 12 08:35:00 2025