LUP Statistics
Record
- Title
- Optimizing FinFET Geometry using a Chemical Mechanical Polishing Process
- Type
- Student Paper
- Publ. year
- 2025
- Author/s
- Böhm, Paul
- Department/s
- Department of Electrical and Information Technology
- In LUP since
- 2025-06-16
Downloads
| Total | This Year | This Month |
| 105 | 105 | 34 |
United States of America  |
38 (40%) |
Sweden  |
14 (15%) |
China  |
7 (7%) |
Singapore  |
5 (5%) |
Italy  |
3 (3%) |
Taiwan (China)  |
3 (3%) |
Brazil  |
3 (3%) |
Ireland  |
2 (2%) |
Hong Kong (China)  |
2 (2%) |
France  |
1 (1%) |
Latvia  |
1 (1%) |
Finland  |
1 (1%) |
United Kingdom of Great Britain and Northern Ireland  |
1 (1%) |
Tunisia  |
1 (1%) |
Japan  |
1 (1%) |
South Korea  |
1 (1%) |
Kyrgyzstan  |
1 (1%) |
Belgium  |
1 (1%) |
Ukraine  |
1 (1%) |
Bulgaria  |
1 (1%) |
Canada  |
1 (1%) |
Germany  |
1 (1%) |
Indonesia  |
1 (1%) |
Viet Nam  |
1 (1%) |
Saint Vincent and the Grenadines  |
1 (1%) |
Ecuador  |
1 (1%) |