A new laser-plasma X-ray source for microscopy and lithography
(1997)- Abstract
- A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.
The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers,... (More) - A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.
The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers, makes this source suitable for table-top X-ray microscopy and lithography. The initial development of the condenser arrangement for a table-top water-window X-ray microscope is described. (Less) - Abstract (Swedish)
- Popular Abstract in Swedish
Avhandlingen beskriver en ny typ av kompakt röntgenkälla baserad på ett laser-producerat plasma (LPP). I motsats till konventionella LPP används inte fasta material som strålmål för den fokuserade laserstrålen. I stället används mikroskopiska vätskedroppar eller vätskestrålar. Detta medför en mycket väsentlig minskning av det skräp (debris) som skickas ut från plasmat. Vissa vätskor resulterar i en fullkomligt "ren" källa.
Den nya källan har flera olika tillämpningsområden. Den kan t.ex. användas för röntgenmikroskopi som tillåter högupplösande studier på biologiska preparat i en naturlig våt miljö. En annan tillämpning är röntgenlitografi. Denna teknik gör det möjligt att... (More) - Popular Abstract in Swedish
Avhandlingen beskriver en ny typ av kompakt röntgenkälla baserad på ett laser-producerat plasma (LPP). I motsats till konventionella LPP används inte fasta material som strålmål för den fokuserade laserstrålen. I stället används mikroskopiska vätskedroppar eller vätskestrålar. Detta medför en mycket väsentlig minskning av det skräp (debris) som skickas ut från plasmat. Vissa vätskor resulterar i en fullkomligt "ren" källa.
Den nya källan har flera olika tillämpningsområden. Den kan t.ex. användas för röntgenmikroskopi som tillåter högupplösande studier på biologiska preparat i en naturlig våt miljö. En annan tillämpning är röntgenlitografi. Denna teknik gör det möjligt att tillverka integrerade kretsar som är mindre än de som görs idag. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/29258
- author
- Rymell, Lars LU
- supervisor
- opponent
-
- Dr Lebert, R.
- organization
- publishing date
- 1997
- type
- Thesis
- publication status
- published
- subject
- keywords
- X-ray microscopy, X-ray lithography, Atomic and molecular physics, multilayer mirror, Fysicumarkivet A:1997:Rymell, Atom- och molekylärfysik, X-ray source, Laser-produced plasma, liquid droplet, debris-free, water window
- pages
- 120 pages
- defense location
- Lecture hall B, Sölvegatan 14, Lund
- defense date
- 1997-05-23 13:15:00
- external identifiers
-
- other:ISRN: LUTFD2/(TFAF-1033)/1-55(1997)
- ISBN
- 91-628-2497-X
- language
- English
- LU publication?
- yes
- id
- 6f0e71a7-e369-41d5-8898-a35506dca891 (old id 29258)
- date added to LUP
- 2016-04-04 14:11:03
- date last changed
- 2018-11-21 21:18:46
@phdthesis{6f0e71a7-e369-41d5-8898-a35506dca891,
abstract = {{A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.<br/><br>
<br/><br>
The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers, makes this source suitable for table-top X-ray microscopy and lithography. The initial development of the condenser arrangement for a table-top water-window X-ray microscope is described.}},
author = {{Rymell, Lars}},
isbn = {{91-628-2497-X}},
keywords = {{X-ray microscopy; X-ray lithography; Atomic and molecular physics; multilayer mirror; Fysicumarkivet A:1997:Rymell; Atom- och molekylärfysik; X-ray source; Laser-produced plasma; liquid droplet; debris-free; water window}},
language = {{eng}},
school = {{Lund University}},
title = {{A new laser-plasma X-ray source for microscopy and lithography}},
year = {{1997}},
}