Optimization of a self-closing effect to produce nanochannels with top slits in fused silica
(2012) In Journal of Vacuum Science and Technology B 30(6).- Abstract
- The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica... (More)
- The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica substrate is used to create the initial slit before oxidation. The details of nanochannel fabrication steps are described and discussed. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766317] (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/3373249
- author
- Graczyk, Mariusz LU ; Balaz, Martina LU ; Kvennefors, Anders LU ; Linke, Heiner LU and Maximov, Ivan LU
- organization
- publishing date
- 2012
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Vacuum Science and Technology B
- volume
- 30
- issue
- 6
- article number
- 06FF09
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- wos:000311667300065
- scopus:84870378917
- ISSN
- 1520-8567
- DOI
- 10.1116/1.4766317
- language
- English
- LU publication?
- yes
- id
- 34bc07f7-dc53-46b5-8809-1d50464f8572 (old id 3373249)
- date added to LUP
- 2016-04-01 10:57:13
- date last changed
- 2023-08-31 15:22:31
@article{34bc07f7-dc53-46b5-8809-1d50464f8572, abstract = {{The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica substrate is used to create the initial slit before oxidation. The details of nanochannel fabrication steps are described and discussed. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766317]}}, author = {{Graczyk, Mariusz and Balaz, Martina and Kvennefors, Anders and Linke, Heiner and Maximov, Ivan}}, issn = {{1520-8567}}, language = {{eng}}, number = {{6}}, publisher = {{American Institute of Physics (AIP)}}, series = {{Journal of Vacuum Science and Technology B}}, title = {{Optimization of a self-closing effect to produce nanochannels with top slits in fused silica}}, url = {{http://dx.doi.org/10.1116/1.4766317}}, doi = {{10.1116/1.4766317}}, volume = {{30}}, year = {{2012}}, }