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Orientation specific deposition of mesoporous particles

Kjellman, Tomas LU ; Bodén, Niklas LU ; Wennerström, Håkan LU ; Edler, Karen LU orcid and Alfredsson, Viveka LU (2014) In APL Materials 2(11).
Abstract
We present a protocol for a facile orientation specific deposition of plate-like mesoporous SBA-15 silica particles onto a surface (mesopores oriented normal to surface). A drop of an aqueous dispersion of particles is placed on the surface and water vaporizes under controlled relative humidity. Three requirements are essential for uniform coverage: particle dispersion should not contain aggregates, a weak attraction between particles and surface is needed, and evaporation rate should be low. Aggregates are removed by stirring/sonication. Weak attraction is realized by introducing cationic groups to the surface. Insight into the mechanisms of the so-called coffee stain effect is also provided. (C) 2014 Author(s). All article content,... (More)
We present a protocol for a facile orientation specific deposition of plate-like mesoporous SBA-15 silica particles onto a surface (mesopores oriented normal to surface). A drop of an aqueous dispersion of particles is placed on the surface and water vaporizes under controlled relative humidity. Three requirements are essential for uniform coverage: particle dispersion should not contain aggregates, a weak attraction between particles and surface is needed, and evaporation rate should be low. Aggregates are removed by stirring/sonication. Weak attraction is realized by introducing cationic groups to the surface. Insight into the mechanisms of the so-called coffee stain effect is also provided. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License. (Less)
Please use this url to cite or link to this publication:
author
; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
APL Materials
volume
2
issue
11
article number
113305
publisher
American Institute of Physics (AIP)
external identifiers
  • wos:000345638800007
  • scopus:84907991757
ISSN
2166-532X
DOI
10.1063/1.4897282
language
English
LU publication?
yes
id
b37d2d29-5d93-4fb5-9e75-66650f687235 (old id 4965681)
date added to LUP
2016-04-01 13:22:08
date last changed
2023-09-02 22:48:48
@article{b37d2d29-5d93-4fb5-9e75-66650f687235,
  abstract     = {{We present a protocol for a facile orientation specific deposition of plate-like mesoporous SBA-15 silica particles onto a surface (mesopores oriented normal to surface). A drop of an aqueous dispersion of particles is placed on the surface and water vaporizes under controlled relative humidity. Three requirements are essential for uniform coverage: particle dispersion should not contain aggregates, a weak attraction between particles and surface is needed, and evaporation rate should be low. Aggregates are removed by stirring/sonication. Weak attraction is realized by introducing cationic groups to the surface. Insight into the mechanisms of the so-called coffee stain effect is also provided. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.}},
  author       = {{Kjellman, Tomas and Bodén, Niklas and Wennerström, Håkan and Edler, Karen and Alfredsson, Viveka}},
  issn         = {{2166-532X}},
  language     = {{eng}},
  number       = {{11}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{APL Materials}},
  title        = {{Orientation specific deposition of mesoporous particles}},
  url          = {{http://dx.doi.org/10.1063/1.4897282}},
  doi          = {{10.1063/1.4897282}},
  volume       = {{2}},
  year         = {{2014}},
}