Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)
Head, Ashley LU ; Chaudhary, Shilpi LU ; Olivier, Giorgia ; Bournel, Fabrice ; Andersen, Jesper N LU ; Rochet, Francois ; Gallet, Jean-Jacques and Schnadt, Joachim LU
(2016)
In Journal of Physical Chemistry C
120(1).
p.243-251
- Abstract
- The atomic layer deposition (ALD) of TiO2 on a RuO2(110) surface from tetrakis(dimethylamido) titanium and water at 110 degrees C was investigated using near ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) at precursor pressures up to 0.1 mbar. In addition to the expected cyclic surface species, evidence for side reactions was found. Dimethylamine adsorbs on the surface during the TDMAT half-cycle, and a second species, likely methyl methylenimine, also forms. The removal of the amide ligand and the formation of an alkyammonium species during the water half-cycle were found to be pressure dependent. The O 1s, Ru 3d, and Ti 2p spectra show the formation of the Ru-O-Ti interface, and the binding energies are consistent with... (More)
- The atomic layer deposition (ALD) of TiO2 on a RuO2(110) surface from tetrakis(dimethylamido) titanium and water at 110 degrees C was investigated using near ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) at precursor pressures up to 0.1 mbar. In addition to the expected cyclic surface species, evidence for side reactions was found. Dimethylamine adsorbs on the surface during the TDMAT half-cycle, and a second species, likely methyl methylenimine, also forms. The removal of the amide ligand and the formation of an alkyammonium species during the water half-cycle were found to be pressure dependent. The O 1s, Ru 3d, and Ti 2p spectra show the formation of the Ru-O-Ti interface, and the binding energies are consistent with formation of TiO2 after one full ALD cycle. Dosing TDMAT on the RuO2(110) surface at room temperature promotes a multilayer formation that begins to desorb at 40 degrees C. The imine species is not seen until 60 degrees C. These insights into the ALD mechanism and precursor pressure dependence on reactivity highlight the utility of NAP-XPS in studying ALD processes and interface formation. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/8731546
- author
- Head, Ashley
LU
; Chaudhary, Shilpi
LU
; Olivier, Giorgia
; Bournel, Fabrice
; Andersen, Jesper N
LU
; Rochet, Francois
; Gallet, Jean-Jacques
and Schnadt, Joachim
LU
- organization
- publishing date
- 2016
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Physical Chemistry C
- volume
- 120
- issue
- 1
- pages
- 243 - 251
- publisher
- The American Chemical Society (ACS)
- external identifiers
-
- wos:000368562200031
- scopus:84954411403
- ISSN
- 1932-7447
- DOI
- 10.1021/acs.jpcc.5b08699
- language
- English
- LU publication?
- yes
- id
- 50154064-716a-4908-b277-01f82f9d7be6 (old id 8731546)
- date added to LUP
- 2016-04-01 11:05:02
- date last changed
- 2023-11-10 11:49:02
@article{50154064-716a-4908-b277-01f82f9d7be6,
abstract = {{The atomic layer deposition (ALD) of TiO2 on a RuO2(110) surface from tetrakis(dimethylamido) titanium and water at 110 degrees C was investigated using near ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) at precursor pressures up to 0.1 mbar. In addition to the expected cyclic surface species, evidence for side reactions was found. Dimethylamine adsorbs on the surface during the TDMAT half-cycle, and a second species, likely methyl methylenimine, also forms. The removal of the amide ligand and the formation of an alkyammonium species during the water half-cycle were found to be pressure dependent. The O 1s, Ru 3d, and Ti 2p spectra show the formation of the Ru-O-Ti interface, and the binding energies are consistent with formation of TiO2 after one full ALD cycle. Dosing TDMAT on the RuO2(110) surface at room temperature promotes a multilayer formation that begins to desorb at 40 degrees C. The imine species is not seen until 60 degrees C. These insights into the ALD mechanism and precursor pressure dependence on reactivity highlight the utility of NAP-XPS in studying ALD processes and interface formation.}},
author = {{Head, Ashley and Chaudhary, Shilpi and Olivier, Giorgia and Bournel, Fabrice and Andersen, Jesper N and Rochet, Francois and Gallet, Jean-Jacques and Schnadt, Joachim}},
issn = {{1932-7447}},
language = {{eng}},
number = {{1}},
pages = {{243--251}},
publisher = {{The American Chemical Society (ACS)}},
series = {{Journal of Physical Chemistry C}},
title = {{Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)}},
url = {{http://dx.doi.org/10.1021/acs.jpcc.5b08699}},
doi = {{10.1021/acs.jpcc.5b08699}},
volume = {{120}},
year = {{2016}},
}