Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography
(2012) ICPS 2012
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/3160040
- author
- Storm, Kristian LU ; Nylund, Gustav LU ; Samuelson, Lars LU and Micolich, Adam
- organization
- publishing date
- 2012
- type
- Contribution to conference
- publication status
- published
- subject
- conference name
- ICPS 2012
- conference location
- Zürich, Switzerland
- conference dates
- 2012-07-29 - 2012-08-03
- language
- English
- LU publication?
- yes
- id
- 154351bf-4110-4867-800a-80b5f064f284 (old id 3160040)
- date added to LUP
- 2016-04-04 13:02:04
- date last changed
- 2021-08-21 04:00:22
@misc{154351bf-4110-4867-800a-80b5f064f284,
author = {{Storm, Kristian and Nylund, Gustav and Samuelson, Lars and Micolich, Adam}},
language = {{eng}},
title = {{Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography}},
year = {{2012}},
}