Advanced

Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography

Storm, Kristian LU ; Nylund, Gustav LU ; Samuelson, Lars LU and Micolich, Adam (2012) ICPS 2012
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to conference
publication status
published
subject
conference name
ICPS 2012
external identifiers
  • Scopus:84855814477
language
English
LU publication?
yes
id
154351bf-4110-4867-800a-80b5f064f284 (old id 3160040)
date added to LUP
2012-10-31 21:09:32
date last changed
2016-10-30 04:42:22
@misc{154351bf-4110-4867-800a-80b5f064f284,
  author       = {Storm, Kristian and Nylund, Gustav and Samuelson, Lars and Micolich, Adam},
  language     = {eng},
  title        = {Realizing lateral wrap-gated nanowire FETs: Controlling gate length with chemistry rather than lithography},
  year         = {2012},
}