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Record
Title
Integration of Ferroelectric HfxZr1-xO2 on Vertical III-V Nanowire Gate-All-Around FETs on Silicon
Type
Journal Article
Publ. year
2022
Author/s
Persson, Anton E. O.; Zhu, Zhongyunshen; Athle, Robin; Wernersson, Lars-Erik
Department/s
Nano Electronics; NanoLund: Centre for Nanoscience
In LUP since
2022-05-30
Downloads

Total This Year This Month
140 33 2
Downloads per country

Sweden 33 (24%)
United States of America 23 (17%)
Unknown 12 (9%)
China 12 (9%)
France 10 (7%)
South Korea 7 (5%)
Germany 7 (5%)
India 6 (4%)
Taiwan (China) 5 (4%)
Netherlands (Kingdom of the) 4 (3%)
Canada 3 (2%)
United Kingdom of Great Britain and Northern Ireland 3 (2%)
Singapore 3 (2%)
Japan 3 (2%)
Hong Kong (China) 3 (2%)
Spain 1 (1%)
Ireland 1 (1%)
Czechia 1 (1%)
Russian Federation 1 (1%)
About
The download statistics shown here have been collected since the launch of LUP in October 2007 and are updated every night. Statistics are available for all records with open access fulltexts. Efforts have been made to exclude downloads by robots and track irregular download activities.

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The information on downloads per country is based on the geolocation of IP addresses and may not be completely accurate. The statistics presented here may also change retroactively when the calculation process is improved to provide more accurate results.

Statistics Last Updated
Wed Aug 14 10:30:14 2024