Eva-Lena Sarwe (Former)
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- 2003
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Mark
Lift-off process for nanoimprint lithography
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2002
-
Mark
Improving stamps for 10 nm level wafer scale nanoimprint lithography
(
- Contribution to journal › Article
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Mark
Fabrication of Si-based nanoimprint stamps with sub-20 nm features
(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
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Mark
Threshold stoichiometry for beam induced nitrogen depletion of SiN
2002) In Nuclear Instruments & Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms 190. p.428-432(
- Contribution to journal › Article
-
Mark
Nanoimprint in mr-L 6000.1 XP/PMMA resist system
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
-
Mark
Next generation nanotechnologies for sensor array fabrication
2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding