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- 2010
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Mark
Electrochemical Investigation of Nickel Pattern Electrodes in H-2/H2O and CO/CO2 Atmospheres
(
- Contribution to journal › Article
- 2005
-
Mark
An alignment procedure for nanoimprint lithography at the sub-20 nm level
2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding