Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
(2004) 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/962516
- author
- Keil, M ; Beck, Marc LU ; Frennesson, G ; Theander, Elke LU ; Bolmsjö, E ; Montelius, Lars LU and Heidari, B
- organization
- publishing date
- 2004
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- J Vac Sci Technol B 22, 3283-3287 (2004)
- conference name
- 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
- conference dates
- 0001-01-02
- external identifiers
-
- scopus:13244273823
- language
- English
- LU publication?
- yes
- id
- c62d7683-ff0b-49fd-b7f0-62152b613573 (old id 962516)
- date added to LUP
- 2016-04-04 13:26:44
- date last changed
- 2022-03-23 19:57:13
@inproceedings{c62d7683-ff0b-49fd-b7f0-62152b613573, author = {{Keil, M and Beck, Marc and Frennesson, G and Theander, Elke and Bolmsjö, E and Montelius, Lars and Heidari, B}}, booktitle = {{J Vac Sci Technol B 22, 3283-3287 (2004)}}, language = {{eng}}, title = {{Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography}}, year = {{2004}}, }