LUP Statistics
Record
- Title
- Integration of Ferroelectric HfxZr1-xO2 on Vertical III-V Nanowire Gate-All-Around FETs on Silicon
- Type
- Journal Article
- Publ. year
- 2022
- Author/s
- Persson, Anton E. O.; Zhu, Zhongyunshen; Athle, Robin; Wernersson, Lars-Erik
- Department/s
- Nano Electronics; NanoLund: Centre for Nanoscience
- In LUP since
- 2022-05-30
Downloads
| Total | This Year | This Month |
| 234 | 34 | 0 |
United States of America  |
56 (24%) |
Sweden  |
37 (16%) |
China  |
26 (11%) |
Unknown  |
15 (6%) |
France  |
13 (6%) |
South Korea  |
10 (4%) |
Germany  |
10 (4%) |
India  |
9 (4%) |
Singapore  |
6 (3%) |
Taiwan (China)  |
6 (3%) |
United Kingdom of Great Britain and Northern Ireland  |
5 (2%) |
Netherlands (Kingdom of the)  |
5 (2%) |
Japan  |
5 (2%) |
Hong Kong (China)  |
5 (2%) |
Canada  |
4 (2%) |
Viet Nam  |
4 (2%) |
Brazil  |
3 (1%) |
Spain  |
2 (1%) |
Iran  |
2 (1%) |
Finland  |
2 (1%) |
Ireland  |
1 (0%) |
Lithuania  |
1 (0%) |
Indonesia  |
1 (0%) |
Czechia  |
1 (0%) |
Denmark  |
1 (0%) |
Malaysia  |
1 (0%) |
Russian Federation  |
1 (0%) |
Ukraine  |
1 (0%) |
Jamaica  |
1 (0%) |