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Nanoimprint Lithography for Molecular-Motor-Based Devices

Haettner, Emelie LU (2016) PHYM01 20161
Solid State Physics
Department of Physics
Abstract
Nanoimprint lithography (NIL) can be used for large scale fabrication of topologically structured surfaces. Structures with a resolution down to 10 nm can be manufactured. This report describes the NIL fabrication of a type of molecular-motor-based device. These devices have, up to now, been fabricated with electron beam lithography (EBL). By using NIL instead, future mass production of devices would be possible. The device has previously contained both 200 nm wide nanochannels as well as 80 micrometer wide, open areas, called loading zones. The large size difference
is problematic in NIL. Patterns were therefore added to the open space of
the loading zones. The designs created in this work were tested in Matlab
simulations, performed... (More)
Nanoimprint lithography (NIL) can be used for large scale fabrication of topologically structured surfaces. Structures with a resolution down to 10 nm can be manufactured. This report describes the NIL fabrication of a type of molecular-motor-based device. These devices have, up to now, been fabricated with electron beam lithography (EBL). By using NIL instead, future mass production of devices would be possible. The device has previously contained both 200 nm wide nanochannels as well as 80 micrometer wide, open areas, called loading zones. The large size difference
is problematic in NIL. Patterns were therefore added to the open space of
the loading zones. The designs created in this work were tested in Matlab
simulations, performed by a collaborator. By patterning the loading zones
it was also possible to control their loading speed. A NIL-compatible
polymer resist, TU7, was tested as a material for the device structures.
TU7 was shown to also compatible with the molecular motors in the device.
A master stamp was used to fabricate an intermediate polymer stamp
(IPS) in a NIL-process. The IPS was then used to imprint the structures
in TU7, in a second NIL-process. The result of the imprint was successful. (Less)
Please use this url to cite or link to this publication:
author
Haettner, Emelie LU
supervisor
organization
course
PHYM01 20161
year
type
H2 - Master's Degree (Two Years)
subject
language
English
id
8896261
date added to LUP
2016-12-21 21:10:36
date last changed
2016-12-21 21:10:36
@misc{8896261,
  abstract     = {Nanoimprint lithography (NIL) can be used for large scale fabrication of topologically structured surfaces. Structures with a resolution down to 10 nm can be manufactured. This report describes the NIL fabrication of a type of molecular-motor-based device. These devices have, up to now, been fabricated with electron beam lithography (EBL). By using NIL instead, future mass production of devices would be possible. The device has previously contained both 200 nm wide nanochannels as well as 80 micrometer wide, open areas, called loading zones. The large size difference
is problematic in NIL. Patterns were therefore added to the open space of
the loading zones. The designs created in this work were tested in Matlab
simulations, performed by a collaborator. By patterning the loading zones
it was also possible to control their loading speed. A NIL-compatible
polymer resist, TU7, was tested as a material for the device structures.
TU7 was shown to also compatible with the molecular motors in the device.
A master stamp was used to fabricate an intermediate polymer stamp
(IPS) in a NIL-process. The IPS was then used to imprint the structures
in TU7, in a second NIL-process. The result of the imprint was successful.},
  author       = {Haettner, Emelie},
  language     = {eng},
  note         = {Student Paper},
  title        = {Nanoimprint Lithography for Molecular-Motor-Based Devices},
  year         = {2016},
}