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Design of solvent vapor annealing tool and study of kinetics of selfassembly of block copolymers for nano-lithography

Wang, Chujun LU (2020) FYSM30 20192
Solid State Physics
Department of Physics
Abstract
Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economically viable. It provides a high resolution, inexpensive, and straightforward approach to nano-size patterning. In this thesis, fundamental concepts and theories of block copolymer lithography are introduced. A well-controlled dynamic solvent vapor annealing chamber is built, and the best annealing condition using this chamber is investigated. Two changed parameters in this thesis are annealing time and initial film thickness. By using atomic force microscopy and other characterization methods, self-assembly structures of PS-b-P4VP films before and after solvent annealing with Tetrahydrofuran are studied. The best arrangement of hexagonally... (More)
Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economically viable. It provides a high resolution, inexpensive, and straightforward approach to nano-size patterning. In this thesis, fundamental concepts and theories of block copolymer lithography are introduced. A well-controlled dynamic solvent vapor annealing chamber is built, and the best annealing condition using this chamber is investigated. Two changed parameters in this thesis are annealing time and initial film thickness. By using atomic force microscopy and other characterization methods, self-assembly structures of PS-b-P4VP films before and after solvent annealing with Tetrahydrofuran are studied. The best arrangement of hexagonally packed vertical cylinders is obtained after 60 min annealing with initial polymer film thickness around 50-57 nm and reaches its equilibrium pitch of 58 nm. This thesis also contains the study of the kinetics of the self-organization process of block copolymer films during annealing. (Less)
Please use this url to cite or link to this publication:
author
Wang, Chujun LU
supervisor
organization
course
FYSM30 20192
year
type
H2 - Master's Degree (Two Years)
subject
language
English
id
9017176
date added to LUP
2020-06-15 09:18:46
date last changed
2020-06-15 09:18:46
@misc{9017176,
  abstract     = {{Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economically viable. It provides a high resolution, inexpensive, and straightforward approach to nano-size patterning. In this thesis, fundamental concepts and theories of block copolymer lithography are introduced. A well-controlled dynamic solvent vapor annealing chamber is built, and the best annealing condition using this chamber is investigated. Two changed parameters in this thesis are annealing time and initial film thickness. By using atomic force microscopy and other characterization methods, self-assembly structures of PS-b-P4VP films before and after solvent annealing with Tetrahydrofuran are studied. The best arrangement of hexagonally packed vertical cylinders is obtained after 60 min annealing with initial polymer film thickness around 50-57 nm and reaches its equilibrium pitch of 58 nm. This thesis also contains the study of the kinetics of the self-organization process of block copolymer films during annealing.}},
  author       = {{Wang, Chujun}},
  language     = {{eng}},
  note         = {{Student Paper}},
  title        = {{Design of solvent vapor annealing tool and study of kinetics of selfassembly of block copolymers for nano-lithography}},
  year         = {{2020}},
}