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Wear resistance investigation of thin film deposition technology

Qi, Yu LU (2024) MMTM05 20241
Production and Materials Engineering
Abstract
This article focuses on the popular thin-film deposition technique chemical vapor deposition (CVD) and outlines its latest research in improving wear resistance. The article highlights how the wear resistance of thin film coatings can be improved through material selection, process parameter optimization, post-processing techniques and structural design. The combined application of these methods has a deep impact on thin film deposition technology. In this paper, an experiment was designed to use a Pin on Disk (PoD) machine to explore whether it could be used to verify the wear resistance of atomic layer deposition (ALD) thin films. The samples were mainly deposited on stainless steel substrates using aluminum oxide, silicon dioxide, and... (More)
This article focuses on the popular thin-film deposition technique chemical vapor deposition (CVD) and outlines its latest research in improving wear resistance. The article highlights how the wear resistance of thin film coatings can be improved through material selection, process parameter optimization, post-processing techniques and structural design. The combined application of these methods has a deep impact on thin film deposition technology. In this paper, an experiment was designed to use a Pin on Disk (PoD) machine to explore whether it could be used to verify the wear resistance of atomic layer deposition (ALD) thin films. The samples were mainly deposited on stainless steel substrates using aluminum oxide, silicon dioxide, and hafnium (IV) oxide as ALD coating materials. It was demonstrated that ALD does influence substrate wear resistance, but there is more scope for improving this methodology for verifying the wear resistance of thin films. (Less)
Please use this url to cite or link to this publication:
author
Qi, Yu LU
supervisor
organization
course
MMTM05 20241
year
type
H2 - Master's Degree (Two Years)
subject
keywords
Thin film deposition, Wear resistance, Atomic layer deposition, Chemical vapor deposition, Pin on disk, Coefficient of friction, Adhesion
report number
LUTMDN/(TMMV-5368)/1-49/ 2024
language
English
id
9163655
date added to LUP
2024-06-14 12:29:03
date last changed
2024-06-14 12:29:03
@misc{9163655,
  abstract     = {{This article focuses on the popular thin-film deposition technique chemical vapor deposition (CVD) and outlines its latest research in improving wear resistance. The article highlights how the wear resistance of thin film coatings can be improved through material selection, process parameter optimization, post-processing techniques and structural design. The combined application of these methods has a deep impact on thin film deposition technology. In this paper, an experiment was designed to use a Pin on Disk (PoD) machine to explore whether it could be used to verify the wear resistance of atomic layer deposition (ALD) thin films. The samples were mainly deposited on stainless steel substrates using aluminum oxide, silicon dioxide, and hafnium (IV) oxide as ALD coating materials. It was demonstrated that ALD does influence substrate wear resistance, but there is more scope for improving this methodology for verifying the wear resistance of thin films.}},
  author       = {{Qi, Yu}},
  language     = {{eng}},
  note         = {{Student Paper}},
  title        = {{Wear resistance investigation of thin film deposition technology}},
  year         = {{2024}},
}