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Block copolymer-based hybrid nanomaterials for nanoimprint applications

Sellin, Philip LU (2022) PHYM01 20212
Solid State Physics
Faculty of Engineering, LTH
Abstract
In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. To facilitate satisfactory pattern transfer from the BCP film into the silicon, optimisation of the infiltration conditions were made. During this process, thermal annealing was observed to induce self-assembly of the BCP PS-b-P4VP into perpendicularly aligned cylinders that were locally hexagonally placed.... (More)
In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. To facilitate satisfactory pattern transfer from the BCP film into the silicon, optimisation of the infiltration conditions were made. During this process, thermal annealing was observed to induce self-assembly of the BCP PS-b-P4VP into perpendicularly aligned cylinders that were locally hexagonally placed. The nanoimprint lithography stamp was found to achieve the transfer of the cylindrical pattern into a polymer film that will later be evaluated for its antibacterial properties. (Less)
Please use this url to cite or link to this publication:
author
Sellin, Philip LU
supervisor
organization
course
PHYM01 20212
year
type
H2 - Master's Degree (Two Years)
subject
keywords
Block copolymer, Sequential infiltration synthesis, Nanoimprint lithography, Reactive ion etching, Self-assembly, Thermal annealing, Solvent vapour annealing, Nanoprocessing, Nanofabrication, Antibacterial
language
English
id
9075761
date added to LUP
2022-02-23 16:27:45
date last changed
2022-02-23 16:27:45
@misc{9075761,
  abstract     = {{In this Master’s thesis project, a block copolymer (BCP) film was used in combination with sequential infiltration synthesis and etching to manufacture a nanoimprint lithography stamp consisting of silicon. The BCP film was designed to contain perpendicularly aligned hexagonally placed cylinders, a pattern that will later be investigated for antibacterial properties after being transferred via nanoimprint lithography to a polymer film. To facilitate satisfactory pattern transfer from the BCP film into the silicon, optimisation of the infiltration conditions were made. During this process, thermal annealing was observed to induce self-assembly of the BCP PS-b-P4VP into perpendicularly aligned cylinders that were locally hexagonally placed. The nanoimprint lithography stamp was found to achieve the transfer of the cylindrical pattern into a polymer film that will later be evaluated for its antibacterial properties.}},
  author       = {{Sellin, Philip}},
  language     = {{eng}},
  note         = {{Student Paper}},
  title        = {{Block copolymer-based hybrid nanomaterials for nanoimprint applications}},
  year         = {{2022}},
}