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Nanoimprint Lithography Based Nanoelectromechanical Device Fabrication

Luo, Gang LU (2009)
Abstract
This thesis presents studies concerning the development of nanoimprint lithography technology, nanoimprint lithography-based nanofabrication, as well as the production of NEMS devices and their characterization. It can be divided into the following parts:

The first part introduces different NIL stamp fabricating methods and processes. The top-down fabricating methods, such as E-beam lithography and scanning probe lithography, and the bottom-up fabricating techniques, such as epitaxial growth and molecular imprints are described. These approaches have been used to produce various stamps, e.g., transparent stamps, high aspect ratio stamps, stamps with atomically flat side-walls, stamps with extremely high resolution, and molecular... (More)
This thesis presents studies concerning the development of nanoimprint lithography technology, nanoimprint lithography-based nanofabrication, as well as the production of NEMS devices and their characterization. It can be divided into the following parts:

The first part introduces different NIL stamp fabricating methods and processes. The top-down fabricating methods, such as E-beam lithography and scanning probe lithography, and the bottom-up fabricating techniques, such as epitaxial growth and molecular imprints are described. These approaches have been used to produce various stamps, e.g., transparent stamps, high aspect ratio stamps, stamps with atomically flat side-walls, stamps with extremely high resolution, and molecular stamps, just to mention a few.

The second part discusses various NIL processes and related considerations. Here, thermal and UV NIL processes are introduced for different purposes, such as pattern transfer and the construction of high aspect ratio structures. The considerations include stamp cleaning and the control of imprinting defects.

The final part involves NEMS device fabrication and characterization. The fabrication of two NEMS devices, based on cantilever arrays and high aspect ratio polymer structures, is presented, and the characterization of the mechanical and optical properties of cantilever arrays based the NEMS device is described. The devices may be employed in applications such as optical valves, accelerometers and mass sensors, whereas the high aspect ratio NEMS devices can be utilized as disposable mass sensors for truly daily use due to their low cost and high throughput. (Less)
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author
supervisor
opponent
  • Professor Chen, Yong, Ecole Nomale SupĂ©rieure(ENS), Paris, France
organization
publishing date
type
Thesis
publication status
published
subject
pages
134 pages
publisher
Department of Physics, Lund University
defense location
Lecture hall B, Physics Department, Sölvegatan 14, Faculty of Engineering, Lund University, Lund
defense date
2009-11-27 13:15
ISBN
978-91-628-7958-7
language
English
LU publication?
yes
id
71beb6ae-73f4-486a-8801-01d093f2febd (old id 1501836)
date added to LUP
2009-11-05 11:03:19
date last changed
2016-09-19 08:45:08
@misc{71beb6ae-73f4-486a-8801-01d093f2febd,
  abstract     = {This thesis presents studies concerning the development of nanoimprint lithography technology, nanoimprint lithography-based nanofabrication, as well as the production of NEMS devices and their characterization. It can be divided into the following parts:<br/><br>
The first part introduces different NIL stamp fabricating methods and processes. The top-down fabricating methods, such as E-beam lithography and scanning probe lithography, and the bottom-up fabricating techniques, such as epitaxial growth and molecular imprints are described. These approaches have been used to produce various stamps, e.g., transparent stamps, high aspect ratio stamps, stamps with atomically flat side-walls, stamps with extremely high resolution, and molecular stamps, just to mention a few.<br/><br>
The second part discusses various NIL processes and related considerations. Here, thermal and UV NIL processes are introduced for different purposes, such as pattern transfer and the construction of high aspect ratio structures. The considerations include stamp cleaning and the control of imprinting defects.<br/><br>
The final part involves NEMS device fabrication and characterization. The fabrication of two NEMS devices, based on cantilever arrays and high aspect ratio polymer structures, is presented, and the characterization of the mechanical and optical properties of cantilever arrays based the NEMS device is described. The devices may be employed in applications such as optical valves, accelerometers and mass sensors, whereas the high aspect ratio NEMS devices can be utilized as disposable mass sensors for truly daily use due to their low cost and high throughput.},
  author       = {Luo, Gang},
  isbn         = {978-91-628-7958-7},
  language     = {eng},
  pages        = {134},
  publisher    = {ARRAY(0x95dbc28)},
  title        = {Nanoimprint Lithography Based Nanoelectromechanical Device Fabrication},
  year         = {2009},
}