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High rate direct current reactive sputter deposition of Al2O3 - Required process parameters

Macak, Karol ; Olsson, Maryam LU and Helmersson, Ulf (1997) 11th International colloquium on plasma processes p.176-176
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author
; and
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
host publication
CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997
pages
176 - 176
publisher
Société française du vide
conference name
11th International colloquium on plasma processes
conference location
Le Mans, France
conference dates
1997-05-25 - 1997-05-29
external identifiers
  • scopus:20544474791
language
English
LU publication?
no
id
12e7d268-680c-4854-a83d-5552874e6428 (old id 4645023)
date added to LUP
2016-04-04 11:41:52
date last changed
2022-01-29 22:20:15
@inproceedings{12e7d268-680c-4854-a83d-5552874e6428,
  author       = {{Macak, Karol and Olsson, Maryam and Helmersson, Ulf}},
  booktitle    = {{CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997}},
  language     = {{eng}},
  pages        = {{176--176}},
  publisher    = {{Société française du vide}},
  title        = {{High rate direct current reactive sputter deposition of Al2O3 - Required process parameters}},
  year         = {{1997}},
}