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Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

Keil, M; Beck, Marc LU ; Frennesson, G; Theander, Elke LU ; Bolmsjö, E; Montelius, Lars LU and Heidari, B (2004) 48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004) In J Vac Sci Technol B 22, 3283-3287 (2004)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
in
J Vac Sci Technol B 22, 3283-3287 (2004)
conference name
48 th Intl Conf on Electron, Ion and Photon Beam Technol and Nanofabric, San Diego, Ca, USA (2004)
external identifiers
  • Scopus:13244273823
language
English
LU publication?
yes
id
c62d7683-ff0b-49fd-b7f0-62152b613573 (old id 962516)
date added to LUP
2008-01-28 17:34:43
date last changed
2016-10-13 04:55:02
@misc{c62d7683-ff0b-49fd-b7f0-62152b613573,
  author       = {Keil, M and Beck, Marc and Frennesson, G and Theander, Elke and Bolmsjö, E and Montelius, Lars and Heidari, B},
  language     = {eng},
  series       = {J Vac Sci Technol B 22, 3283-3287 (2004)},
  title        = {Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography},
  year         = {2004},
}