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Multi-photon lithography on thin films for efficient fabrication of 2D and 2.5D meta-atoms

Papamakarios, S. ; Zyla, G. ; Zografopoulos, D. C. ; Christoforidou, A. ; Kenanakis, G. ; Farsari, M. and Tsilipakos, O. (2025) 19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025 In 19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025 p.260-262
Abstract

Direct laser writing (DLW) has arise interest in a variety of fields due to the capabilities that we get from the realization of 2D and 3D structures with high resolution fabrication techniques. Multi-photon lithography (MPL) relies on non-linear absorption effects, making possible the fabrication of metasurfaces with feature size beyond the diffraction limit. A new approach in this direction is to use thin films in order to fabricate planar surfaces, known as metasurfaces, that can manipulate light in different forms and can provide a new process with significant advantages in fabrication time, the cost and the usage of masks compared to conventional lithographic techniques.

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author
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publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
host publication
19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025
series title
19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025
pages
260 - 262
publisher
IEEE - Institute of Electrical and Electronics Engineers Inc.
conference name
19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025
conference location
Amsterdam, Netherlands
conference dates
2025-09-01 - 2025-09-06
external identifiers
  • scopus:105019057146
ISBN
9798331536565
DOI
10.1109/Metamaterials65622.2025.11174211
language
English
LU publication?
no
additional info
Publisher Copyright: © 2025 IEEE.
id
000d252a-8939-4eb8-9f42-db0b2ed43f8b
date added to LUP
2026-01-22 11:17:39
date last changed
2026-01-22 11:18:07
@inproceedings{000d252a-8939-4eb8-9f42-db0b2ed43f8b,
  abstract     = {{<p>Direct laser writing (DLW) has arise interest in a variety of fields due to the capabilities that we get from the realization of 2D and 3D structures with high resolution fabrication techniques. Multi-photon lithography (MPL) relies on non-linear absorption effects, making possible the fabrication of metasurfaces with feature size beyond the diffraction limit. A new approach in this direction is to use thin films in order to fabricate planar surfaces, known as metasurfaces, that can manipulate light in different forms and can provide a new process with significant advantages in fabrication time, the cost and the usage of masks compared to conventional lithographic techniques.</p>}},
  author       = {{Papamakarios, S. and Zyla, G. and Zografopoulos, D. C. and Christoforidou, A. and Kenanakis, G. and Farsari, M. and Tsilipakos, O.}},
  booktitle    = {{19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025}},
  isbn         = {{9798331536565}},
  language     = {{eng}},
  pages        = {{260--262}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  series       = {{19th International Congress on Artificial Materials for Novel Wave Phenomena, Metamaterials 2025}},
  title        = {{Multi-photon lithography on thin films for efficient fabrication of 2D and 2.5D meta-atoms}},
  url          = {{http://dx.doi.org/10.1109/Metamaterials65622.2025.11174211}},
  doi          = {{10.1109/Metamaterials65622.2025.11174211}},
  year         = {{2025}},
}