Investigation of PMMA resist residues using photoelectron microscopy
Maximov, Ivan LU
; Zakharov, Alexei
LU
; Holmqvist, T.
; Montelius, Lars
LU
and Lindau, Ingolf
LU
(2002)
In Journal of Vacuum Science and Technology
B20(3).
p.1139-1142
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/974538
- author
- Maximov, Ivan
LU
; Zakharov, Alexei
LU
; Holmqvist, T.
; Montelius, Lars
LU
and Lindau, Ingolf
LU
- organization
- publishing date
- 2002
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Vacuum Science and Technology
- volume
- B20
- issue
- 3
- pages
- 1139 - 1142
- language
- English
- LU publication?
- yes
- id
- 08404429-2adb-489f-b281-2549e35fb8cc (old id 974538)
- date added to LUP
- 2016-04-04 13:05:35
- date last changed
- 2025-04-04 15:00:15
@article{08404429-2adb-489f-b281-2549e35fb8cc,
author = {{Maximov, Ivan and Zakharov, Alexei and Holmqvist, T. and Montelius, Lars and Lindau, Ingolf}},
language = {{eng}},
number = {{3}},
pages = {{1139--1142}},
series = {{Journal of Vacuum Science and Technology}},
title = {{Investigation of PMMA resist residues using photoelectron microscopy}},
volume = {{B20}},
year = {{2002}},
}