Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application
(1999) In Surface & Coatings Technology 122(2-3). p.202-207- Abstract
- Stoichiometric Al2O3 films are produced with a pure Al source in the metallic state in an O2+Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-to-substrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/4645083
- author
- Olsson, Maryam LU ; Macak, Karol and Graf, Wolfgang
- publishing date
- 1999
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Al2O3, Large area coatings, Reactive d.c. magnetron sputtering
- in
- Surface & Coatings Technology
- volume
- 122
- issue
- 2-3
- pages
- 202 - 207
- publisher
- Elsevier
- external identifiers
-
- scopus:0012812949
- ISSN
- 0257-8972
- DOI
- 10.1016/S0257-8972(99)00378-3
- language
- English
- LU publication?
- no
- id
- 0973b37f-a1f1-434c-a235-40c652b5f2b9 (old id 4645083)
- date added to LUP
- 2016-04-01 16:51:46
- date last changed
- 2022-01-28 22:39:31
@article{0973b37f-a1f1-434c-a235-40c652b5f2b9, abstract = {{Stoichiometric Al2O3 films are produced with a pure Al source in the metallic state in an O2+Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-to-substrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.}}, author = {{Olsson, Maryam and Macak, Karol and Graf, Wolfgang}}, issn = {{0257-8972}}, keywords = {{Al2O3; Large area coatings; Reactive d.c. magnetron sputtering}}, language = {{eng}}, number = {{2-3}}, pages = {{202--207}}, publisher = {{Elsevier}}, series = {{Surface & Coatings Technology}}, title = {{Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application}}, url = {{http://dx.doi.org/10.1016/S0257-8972(99)00378-3}}, doi = {{10.1016/S0257-8972(99)00378-3}}, volume = {{122}}, year = {{1999}}, }