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Si(100)2 × 1: the clean and ammonia exposed surface studied with high resolution core-level spectroscopy

Larsson, Christer LU ; Andersson, Caijsa; Prince, Nicholas and Flodström, Anders (1992) In Surface Science 271(3). p.349-354
Abstract
High resolution core-level spectroscopy was utilized to study the clean and NH3 exposed Si(100)2×1 surface. The clean surface exhibits two approximately equal intensity surface core-level components at −0.48 and 0.28 eV binding energy referred to the bulk component. NH3 exposure at 300 K induces two surface core-level components at 0.31 and 0.72 eV relative binding energy that can be assigned to surface Si atoms bonded to H and NH2, respectively. Alternative interpretations for the adsorption based on different interpretations of the clean surface core-level spectra are discussed. The steps between adsorption at 300 K and the beginning of subsurface silicon nitride formation by annealing the surface up to 1000 K are investigated.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Surface Science
volume
271
issue
3
pages
349 - 354
publisher
Elsevier
external identifiers
  • scopus:0026881859
ISSN
0039-6028
DOI
10.1016/0039-6028(92)90899-H
language
English
LU publication?
no
id
e469c5e9-5c65-48e9-b60d-846a2aecd2b0 (old id 1056517)
date added to LUP
2008-04-16 11:43:32
date last changed
2017-07-23 04:39:40
@article{e469c5e9-5c65-48e9-b60d-846a2aecd2b0,
  abstract     = {High resolution core-level spectroscopy was utilized to study the clean and NH3 exposed Si(100)2×1 surface. The clean surface exhibits two approximately equal intensity surface core-level components at −0.48 and 0.28 eV binding energy referred to the bulk component. NH3 exposure at 300 K induces two surface core-level components at 0.31 and 0.72 eV relative binding energy that can be assigned to surface Si atoms bonded to H and NH2, respectively. Alternative interpretations for the adsorption based on different interpretations of the clean surface core-level spectra are discussed. The steps between adsorption at 300 K and the beginning of subsurface silicon nitride formation by annealing the surface up to 1000 K are investigated.},
  author       = {Larsson, Christer and Andersson, Caijsa and Prince, Nicholas and Flodström, Anders},
  issn         = {0039-6028},
  language     = {eng},
  number       = {3},
  pages        = {349--354},
  publisher    = {Elsevier},
  series       = {Surface Science},
  title        = {Si(100)2 × 1: the clean and ammonia exposed surface studied with high resolution core-level spectroscopy},
  url          = {http://dx.doi.org/10.1016/0039-6028(92)90899-H},
  volume       = {271},
  year         = {1992},
}