Advanced

A photoelectron spectroscopy and photon stimulated desorption study of H2O on Si(100) 2×1

Larsson, Christer LU ; Flodström, Anders; Nyholm, Ralf LU ; Incoccia, Lucia and Senf, Friedrich (1987) In Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films 5(6). p.3321-3324
Abstract
We have studied H2O adsorption on the Si(100) surface using photoelectron spectroscopy to record Si valence bands and Si 2p core level spectra; and photon stimulated desorption to record Si 2p edge total electron yield and H + -ion yield spectra. We assign the valence-band H2O induced peaks at EB=6.3 and 11.2 eV to the Si–OH and to the O–H bonds, respectively. The H2O dosed Si 2p core level spectrum exhibits two H2O induced equal intensity surface peaks with surface core level shifts of +0.25 and +1.00 eV that we assign to surface Si atoms in the Si–H and the Si–OH bonds, respectively. We interpret the features in the Si 2p edge H + -ion yield spectrum as ion desorption from SiO2 at surface defect minority sites. We conclude that H2O... (More)
We have studied H2O adsorption on the Si(100) surface using photoelectron spectroscopy to record Si valence bands and Si 2p core level spectra; and photon stimulated desorption to record Si 2p edge total electron yield and H + -ion yield spectra. We assign the valence-band H2O induced peaks at EB=6.3 and 11.2 eV to the Si–OH and to the O–H bonds, respectively. The H2O dosed Si 2p core level spectrum exhibits two H2O induced equal intensity surface peaks with surface core level shifts of +0.25 and +1.00 eV that we assign to surface Si atoms in the Si–H and the Si–OH bonds, respectively. We interpret the features in the Si 2p edge H + -ion yield spectrum as ion desorption from SiO2 at surface defect minority sites. We conclude that H2O adsorbs dissociatively as H and OH radicals on the Si(100) 2×1 surface dimers and that there are defect minority sites on the surface where H2O adsorption causes SiO2 formation. (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
SORPTIVE PROPERTIES, SILICON, WATER, PHOTOELECTRON SPECTROSCOPY, DESORPTION, HYDROXYL RADICALS, IMPURITY STATES
in
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
volume
5
issue
6
pages
3321 - 3324
publisher
American Vacuum Society
external identifiers
  • scopus:84912971572
ISSN
1520-8559
DOI
10.1116/1.574190
language
English
LU publication?
no
id
710e0412-b8c2-4376-b1f1-9e1c4ad72f1b (old id 1056641)
date added to LUP
2008-04-16 15:21:27
date last changed
2017-07-23 03:36:11
@article{710e0412-b8c2-4376-b1f1-9e1c4ad72f1b,
  abstract     = {We have studied H2O adsorption on the Si(100) surface using photoelectron spectroscopy to record Si valence bands and Si 2p core level spectra; and photon stimulated desorption to record Si 2p edge total electron yield and H + -ion yield spectra. We assign the valence-band H2O induced peaks at EB=6.3 and 11.2 eV to the Si–OH and to the O–H bonds, respectively. The H2O dosed Si 2p core level spectrum exhibits two H2O induced equal intensity surface peaks with surface core level shifts of +0.25 and +1.00 eV that we assign to surface Si atoms in the Si–H and the Si–OH bonds, respectively. We interpret the features in the Si 2p edge H + -ion yield spectrum as ion desorption from SiO2 at surface defect minority sites. We conclude that H2O adsorbs dissociatively as H and OH radicals on the Si(100) 2×1 surface dimers and that there are defect minority sites on the surface where H2O adsorption causes SiO2 formation.},
  author       = {Larsson, Christer and Flodström, Anders and Nyholm, Ralf and Incoccia, Lucia and Senf, Friedrich},
  issn         = {1520-8559},
  keyword      = {SORPTIVE PROPERTIES,SILICON,WATER,PHOTOELECTRON SPECTROSCOPY,DESORPTION,HYDROXYL RADICALS,IMPURITY STATES},
  language     = {eng},
  number       = {6},
  pages        = {3321--3324},
  publisher    = {American Vacuum Society},
  series       = {Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films},
  title        = {A photoelectron spectroscopy and photon stimulated desorption study of H2O on Si(100) 2×1},
  url          = {http://dx.doi.org/10.1116/1.574190},
  volume       = {5},
  year         = {1987},
}