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Experimental methods of determining the activity depth distribution of implanted 210Pb in glass.

Roos, Birgitta LU and Samuelsson, Christer LU (2002) In Journal of Environmental Radioactivity 63(2). p.135-151
Abstract
Glass is often used in radon surveys to estimate retrospective radon concentrations, as radon progenies are embedded in the upper surface layer. Experimental methods based on etching to determine the depth distribution of recoil-implanted 210Po in glass from radon decay in air is presented. By carefully controlling chemical concentrations and exposure time during which the glass is etched, stepwise removal of the surface material was possible. Two different etching agents, diluted HF/HNO3 and NaOH were utilised, with very similar results. Experimental recoil depths of 210Po agree with theoretical calculations from the literature. The maximum implantation depth obtained using this procedure was 100 +/- 20nm.
Please use this url to cite or link to this publication:
author
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organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Environmental Radioactivity
volume
63
issue
2
pages
135 - 151
publisher
Elsevier
external identifiers
  • pmid:12363267
  • wos:000178569300003
  • scopus:0035996912
ISSN
1879-1700
DOI
10.1016/S0265-931X(02)00022-X
language
English
LU publication?
yes
id
a245090a-fbae-4caf-a977-65bdb423e30c (old id 110785)
alternative location
http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?cmd=Retrieve&db=PubMed&list_uids=12363267&dopt=Abstract
date added to LUP
2016-04-01 11:55:36
date last changed
2022-02-25 23:24:24
@article{a245090a-fbae-4caf-a977-65bdb423e30c,
  abstract     = {{Glass is often used in radon surveys to estimate retrospective radon concentrations, as radon progenies are embedded in the upper surface layer. Experimental methods based on etching to determine the depth distribution of recoil-implanted 210Po in glass from radon decay in air is presented. By carefully controlling chemical concentrations and exposure time during which the glass is etched, stepwise removal of the surface material was possible. Two different etching agents, diluted HF/HNO3 and NaOH were utilised, with very similar results. Experimental recoil depths of 210Po agree with theoretical calculations from the literature. The maximum implantation depth obtained using this procedure was 100 +/- 20nm.}},
  author       = {{Roos, Birgitta and Samuelsson, Christer}},
  issn         = {{1879-1700}},
  language     = {{eng}},
  number       = {{2}},
  pages        = {{135--151}},
  publisher    = {{Elsevier}},
  series       = {{Journal of Environmental Radioactivity}},
  title        = {{Experimental methods of determining the activity depth distribution of implanted 210Pb in glass.}},
  url          = {{http://dx.doi.org/10.1016/S0265-931X(02)00022-X}},
  doi          = {{10.1016/S0265-931X(02)00022-X}},
  volume       = {{63}},
  year         = {{2002}},
}