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Oxygen-etching of h-BN/Ru(0001) nanomesh on the nano- and mesoscopic scale

Goriachko, A.; Zakharov, Alexei LU and Over, H. (2008) In Journal of Physical Chemistry C 112(28). p.10423-10427
Abstract
The stability of the recently discovered b-BN/Ru(0001) nanomesh is of crucial importance for potential applications as a nanotemplate. In particular, thermal stability in oxygen environment is important for nanocatalysis applications. We report here on the etching experiments of the h-BN layer by molecular oxygen exposure at elevated temperatures. This process is studied both by scanning tunneling microscopy (STM) on a microscopic scale and with in situ low energy electron microscopy (LEEM) on the mesoscopic scale. Temperature thresholds are determined for the microscopic (600 degrees C) and the mesoscopic (750 degrees C) etching processes for O-2 pressures up to 1 x 10(-6) mbar. Submonolayer amounts of An deposited on the h-BN/Ru(0001)... (More)
The stability of the recently discovered b-BN/Ru(0001) nanomesh is of crucial importance for potential applications as a nanotemplate. In particular, thermal stability in oxygen environment is important for nanocatalysis applications. We report here on the etching experiments of the h-BN layer by molecular oxygen exposure at elevated temperatures. This process is studied both by scanning tunneling microscopy (STM) on a microscopic scale and with in situ low energy electron microscopy (LEEM) on the mesoscopic scale. Temperature thresholds are determined for the microscopic (600 degrees C) and the mesoscopic (750 degrees C) etching processes for O-2 pressures up to 1 x 10(-6) mbar. Submonolayer amounts of An deposited on the h-BN/Ru(0001) nanomesh improve considerably the stability of the h-BN nanomesh against etching by O-2. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Physical Chemistry C
volume
112
issue
28
pages
10423 - 10427
publisher
The American Chemical Society
external identifiers
  • wos:000257542600015
  • scopus:50249154050
ISSN
1932-7447
DOI
10.1021/jp802359u
language
English
LU publication?
yes
id
b6b31989-e0b1-4299-8aea-2034054cd84b (old id 1254715)
date added to LUP
2008-10-17 15:25:54
date last changed
2017-09-10 03:42:40
@article{b6b31989-e0b1-4299-8aea-2034054cd84b,
  abstract     = {The stability of the recently discovered b-BN/Ru(0001) nanomesh is of crucial importance for potential applications as a nanotemplate. In particular, thermal stability in oxygen environment is important for nanocatalysis applications. We report here on the etching experiments of the h-BN layer by molecular oxygen exposure at elevated temperatures. This process is studied both by scanning tunneling microscopy (STM) on a microscopic scale and with in situ low energy electron microscopy (LEEM) on the mesoscopic scale. Temperature thresholds are determined for the microscopic (600 degrees C) and the mesoscopic (750 degrees C) etching processes for O-2 pressures up to 1 x 10(-6) mbar. Submonolayer amounts of An deposited on the h-BN/Ru(0001) nanomesh improve considerably the stability of the h-BN nanomesh against etching by O-2.},
  author       = {Goriachko, A. and Zakharov, Alexei and Over, H.},
  issn         = {1932-7447},
  language     = {eng},
  number       = {28},
  pages        = {10423--10427},
  publisher    = {The American Chemical Society},
  series       = {Journal of Physical Chemistry C},
  title        = {Oxygen-etching of h-BN/Ru(0001) nanomesh on the nano- and mesoscopic scale},
  url          = {http://dx.doi.org/10.1021/jp802359u},
  volume       = {112},
  year         = {2008},
}