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Focused ion beam fabrication of novel core-shell nanowire structures

He, Li; Johansson, Jonas LU ; Murayama, Mitsuhiro and Hull, Robert (2008) In Nanotechnology 19(44).
Abstract
A novel method of indirect deposition by means of a focused ion beam (FIB) is utilized to develop metal/insulator/semiconductor nanowire core-shell structures. This method is based upon depositing an annular pattern centered on a nanowire, with secondary deposition then coating the wire. Typical cross-sectional deposition area increments as a function of ion doses are 1.3 x 10(-2) mu m(2) nC(-1) for Pt and 3.5 x 10(-2) mu m(2) nC(-1) for SiO2. The structures are examined with a transmission electron microscope (TEM) using a new nanowire TEM sample preparation method that allows direct examinations of individually selected core-shell nanowires fabricated under different indirect FIB deposition conditions. Elemental analyses by means of... (More)
A novel method of indirect deposition by means of a focused ion beam (FIB) is utilized to develop metal/insulator/semiconductor nanowire core-shell structures. This method is based upon depositing an annular pattern centered on a nanowire, with secondary deposition then coating the wire. Typical cross-sectional deposition area increments as a function of ion doses are 1.3 x 10(-2) mu m(2) nC(-1) for Pt and 3.5 x 10(-2) mu m(2) nC(-1) for SiO2. The structures are examined with a transmission electron microscope (TEM) using a new nanowire TEM sample preparation method that allows direct examinations of individually selected core-shell nanowires fabricated under different indirect FIB deposition conditions. Elemental analyses by means of energy dispersive x-ray spectroscopy and electron energy filtered TEM imaging verify the deposition of SiO2 and Pt layers. Relatively uniform Pt and SiO2 coatings on individual GaP nanowires can be achieved with overall thickness deviation of about 10% for deposition up to 25-30 nm thick Pt or SiO2 shells. It should be possible to extend this approach to any nanowire/nanotube system, and to a wide range of coatings in any desired layer sequences. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Nanotechnology
volume
19
issue
44
publisher
IOP Publishing
external identifiers
  • wos:000259701800025
  • scopus:58149267989
ISSN
0957-4484
DOI
10.1088/0957-4484/19/44/445610
language
English
LU publication?
yes
id
0ca4cf08-1ab6-49fc-a54b-cfe1571a75e3 (old id 1285690)
date added to LUP
2009-02-06 09:38:51
date last changed
2017-01-01 05:09:09
@article{0ca4cf08-1ab6-49fc-a54b-cfe1571a75e3,
  abstract     = {A novel method of indirect deposition by means of a focused ion beam (FIB) is utilized to develop metal/insulator/semiconductor nanowire core-shell structures. This method is based upon depositing an annular pattern centered on a nanowire, with secondary deposition then coating the wire. Typical cross-sectional deposition area increments as a function of ion doses are 1.3 x 10(-2) mu m(2) nC(-1) for Pt and 3.5 x 10(-2) mu m(2) nC(-1) for SiO2. The structures are examined with a transmission electron microscope (TEM) using a new nanowire TEM sample preparation method that allows direct examinations of individually selected core-shell nanowires fabricated under different indirect FIB deposition conditions. Elemental analyses by means of energy dispersive x-ray spectroscopy and electron energy filtered TEM imaging verify the deposition of SiO2 and Pt layers. Relatively uniform Pt and SiO2 coatings on individual GaP nanowires can be achieved with overall thickness deviation of about 10% for deposition up to 25-30 nm thick Pt or SiO2 shells. It should be possible to extend this approach to any nanowire/nanotube system, and to a wide range of coatings in any desired layer sequences.},
  articleno    = {445610},
  author       = {He, Li and Johansson, Jonas and Murayama, Mitsuhiro and Hull, Robert},
  issn         = {0957-4484},
  language     = {eng},
  number       = {44},
  publisher    = {IOP Publishing},
  series       = {Nanotechnology},
  title        = {Focused ion beam fabrication of novel core-shell nanowire structures},
  url          = {http://dx.doi.org/10.1088/0957-4484/19/44/445610},
  volume       = {19},
  year         = {2008},
}