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Isolating single selected quantum dots using cryogenic photolithography

Fälth, S; Zwiller, Valéry LU ; Seifert, Werner LU and Pistol, Mats-Erik LU (2002) Proceedings of the 19th Nordic Semiconductor Meeting T101. p.133-135
Abstract
We propose and demonstrate a technique combining micro-photoluminescence imaging with scanning photolithography at Cryogenic temperatures for creating photoresist masks at designated locations relative to single selected self-assembled quantum dots. The technique is demonstrated by producing a photoresist mask on top of a single selected InP quantum dot imbedded in GaInP. A mesa containing the quantum dot is then created by wet chemical etching. The combination of micro-photoluminescence and scanning photolithography relies on the use of two different lasers with a micro-photoluminescence setup, each laser having different power, focusing and wavelength. The resulting structure enables many experiments and applications in the emerging... (More)
We propose and demonstrate a technique combining micro-photoluminescence imaging with scanning photolithography at Cryogenic temperatures for creating photoresist masks at designated locations relative to single selected self-assembled quantum dots. The technique is demonstrated by producing a photoresist mask on top of a single selected InP quantum dot imbedded in GaInP. A mesa containing the quantum dot is then created by wet chemical etching. The combination of micro-photoluminescence and scanning photolithography relies on the use of two different lasers with a micro-photoluminescence setup, each laser having different power, focusing and wavelength. The resulting structure enables many experiments and applications in the emerging field of single quantum dot physics. (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Wet chemical etching
host publication
PHYSICA SCRIPTA
volume
T101
pages
133 - 135
publisher
Royal Swedish Academy of Sciences
conference name
Proceedings of the 19th Nordic Semiconductor Meeting
conference location
Lyngby, Denmark
conference dates
2001-05-20 - 2001-05-23
external identifiers
  • wos:000179465600035
  • other:CODEN: PHSTER
  • scopus:0036437645
ISSN
1402-4896
0031-8949
DOI
10.1238/Physica.Topical.101a00133
language
English
LU publication?
yes
id
13b273f9-bfa6-47a6-a4fb-63b23a469bea (old id 322733)
date added to LUP
2007-11-27 12:23:02
date last changed
2019-02-20 03:42:39
@inproceedings{13b273f9-bfa6-47a6-a4fb-63b23a469bea,
  abstract     = {We propose and demonstrate a technique combining micro-photoluminescence imaging with scanning photolithography at Cryogenic temperatures for creating photoresist masks at designated locations relative to single selected self-assembled quantum dots. The technique is demonstrated by producing a photoresist mask on top of a single selected InP quantum dot imbedded in GaInP. A mesa containing the quantum dot is then created by wet chemical etching. The combination of micro-photoluminescence and scanning photolithography relies on the use of two different lasers with a micro-photoluminescence setup, each laser having different power, focusing and wavelength. The resulting structure enables many experiments and applications in the emerging field of single quantum dot physics.},
  author       = {Fälth, S and Zwiller, Valéry and Seifert, Werner and Pistol, Mats-Erik},
  issn         = {1402-4896},
  keyword      = {Wet chemical etching},
  language     = {eng},
  location     = {Lyngby, Denmark},
  pages        = {133--135},
  publisher    = {Royal Swedish Academy of Sciences},
  title        = {Isolating single selected quantum dots using cryogenic photolithography},
  url          = {http://dx.doi.org/10.1238/Physica.Topical.101a00133},
  volume       = {T101},
  year         = {2002},
}