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ZnO nanocrystals on SiO2/Si surfaces thermally cleaned in ultrahigh vacuum and characterized using spectroscopic photoemission and low energy electron microscopy

Ericsson, Leif K. E.; Magnusson, Kjell O. and Zakharov, Alexei LU (2010) In Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films 28(3). p.438-442
Abstract
Thermal cleaning in ultrahigh vacuum of ZnO nanocrystals distributed on SiO2/Si surfaces has been studied using spectroscopic photoemission and low energy electron microscopy (SPELEEM). This study thus concern weakly bound ZnO nanocrystals covering only 5%-10% of the substrate. Chemical properties, crystallinity, and distribution of nanocrystals are used to correlate images acquired with the different techniques showing excellent correspondence. The nanocrystals are shown to be clean enough after thermal cleaning at 650 degrees C to be imaged by LEEM and x-ray PEEM as well as chemically analyzed by site selective x-ray photoelectron spectroscopy (mu-XPS). mu-XPS shows a sharp Zn 3d peak and resolve differences in O 1s states in oxides. The... (More)
Thermal cleaning in ultrahigh vacuum of ZnO nanocrystals distributed on SiO2/Si surfaces has been studied using spectroscopic photoemission and low energy electron microscopy (SPELEEM). This study thus concern weakly bound ZnO nanocrystals covering only 5%-10% of the substrate. Chemical properties, crystallinity, and distribution of nanocrystals are used to correlate images acquired with the different techniques showing excellent correspondence. The nanocrystals are shown to be clean enough after thermal cleaning at 650 degrees C to be imaged by LEEM and x-ray PEEM as well as chemically analyzed by site selective x-ray photoelectron spectroscopy (mu-XPS). mu-XPS shows a sharp Zn 3d peak and resolve differences in O 1s states in oxides. The strong LEEM reflections together with the obtained chemical information indicates that the ZnO nanocrystals were thermally cleaned, but do not indicate any decomposition of the nanocrystals. mu-XPS was also used to determine the thickness of SiO2 on Si. This article is the first to our knowledge where the versatile technique SPELEEM has been used to characterize ZnO nanocrystals. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
semiconductors, wide band gap, surface cleaning, spectrochemical analysis, nanostructured materials, electron microscopy, II-VI semiconductors, X-ray photoelectron spectra, zinc compounds
in
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
volume
28
issue
3
pages
438 - 442
publisher
American Vacuum Society
external identifiers
  • wos:000277241900010
  • scopus:77952358216
ISSN
1520-8559
DOI
10.1116/1.3372804
language
English
LU publication?
yes
id
56e4e153-9e79-493a-a51e-c0fc011ef0a8 (old id 1619354)
date added to LUP
2010-06-22 09:27:03
date last changed
2018-05-29 09:26:19
@article{56e4e153-9e79-493a-a51e-c0fc011ef0a8,
  abstract     = {Thermal cleaning in ultrahigh vacuum of ZnO nanocrystals distributed on SiO2/Si surfaces has been studied using spectroscopic photoemission and low energy electron microscopy (SPELEEM). This study thus concern weakly bound ZnO nanocrystals covering only 5%-10% of the substrate. Chemical properties, crystallinity, and distribution of nanocrystals are used to correlate images acquired with the different techniques showing excellent correspondence. The nanocrystals are shown to be clean enough after thermal cleaning at 650 degrees C to be imaged by LEEM and x-ray PEEM as well as chemically analyzed by site selective x-ray photoelectron spectroscopy (mu-XPS). mu-XPS shows a sharp Zn 3d peak and resolve differences in O 1s states in oxides. The strong LEEM reflections together with the obtained chemical information indicates that the ZnO nanocrystals were thermally cleaned, but do not indicate any decomposition of the nanocrystals. mu-XPS was also used to determine the thickness of SiO2 on Si. This article is the first to our knowledge where the versatile technique SPELEEM has been used to characterize ZnO nanocrystals.},
  author       = {Ericsson, Leif K. E. and Magnusson, Kjell O. and Zakharov, Alexei},
  issn         = {1520-8559},
  keyword      = {semiconductors,wide band gap,surface cleaning,spectrochemical analysis,nanostructured materials,electron microscopy,II-VI semiconductors,X-ray photoelectron spectra,zinc compounds},
  language     = {eng},
  number       = {3},
  pages        = {438--442},
  publisher    = {American Vacuum Society},
  series       = {Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films},
  title        = {ZnO nanocrystals on SiO2/Si surfaces thermally cleaned in ultrahigh vacuum and characterized using spectroscopic photoemission and low energy electron microscopy},
  url          = {http://dx.doi.org/10.1116/1.3372804},
  volume       = {28},
  year         = {2010},
}