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Laser-produced plasma EUV source based on tin-rich, thin-layer targets

Rakowski, Rafal LU ; Mikolajczyk, J.; Bartnik, A.; Fiedorowicz, H.; de Dortan, F. de Gaufridy; Jarocki, R.; Kostecki, J.; Szczurek, M. and Wachulak, P. (2011) In Applied Physics B 102(3). p.559-567
Abstract
In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. A thin layer of pure tin and composite layers consisting of Sn with Si, SiO and LiF are investigated. The target composed of several thin layers produces less debris than the other targets and provides a conversion efficiency (CE) in the 13.5-nm +/- 1% band at least comparable to the CE for the pure tin slab target. The largest CE was observed for the target composed of a mixture of Sn and LiF, due to the fact that lithium, similarly to tin, is a strong emitter at 13.5 nm.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Applied Physics B
volume
102
issue
3
pages
559 - 567
publisher
Springer
external identifiers
  • wos:000287746700018
  • scopus:79955882702
ISSN
0946-2171
DOI
10.1007/s00340-010-4193-5
language
English
LU publication?
yes
id
db9cd439-3512-44e4-bb1e-aef85306335b (old id 1870208)
date added to LUP
2011-04-19 10:51:45
date last changed
2017-01-01 03:53:00
@article{db9cd439-3512-44e4-bb1e-aef85306335b,
  abstract     = {In this paper a new approach to a laser-produced plasma EUV source based on a tin target is presented. A thin layer of pure tin and composite layers consisting of Sn with Si, SiO and LiF are investigated. The target composed of several thin layers produces less debris than the other targets and provides a conversion efficiency (CE) in the 13.5-nm +/- 1% band at least comparable to the CE for the pure tin slab target. The largest CE was observed for the target composed of a mixture of Sn and LiF, due to the fact that lithium, similarly to tin, is a strong emitter at 13.5 nm.},
  author       = {Rakowski, Rafal and Mikolajczyk, J. and Bartnik, A. and Fiedorowicz, H. and de Dortan, F. de Gaufridy and Jarocki, R. and Kostecki, J. and Szczurek, M. and Wachulak, P.},
  issn         = {0946-2171},
  language     = {eng},
  number       = {3},
  pages        = {559--567},
  publisher    = {Springer},
  series       = {Applied Physics B},
  title        = {Laser-produced plasma EUV source based on tin-rich, thin-layer targets},
  url          = {http://dx.doi.org/10.1007/s00340-010-4193-5},
  volume       = {102},
  year         = {2011},
}