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Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture

Forchheimer, Daniel; Luo, Gang LU ; Ye, Lei LU and Montelius, Lars LU (2011) 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication In Journal of Vacuum Science & Technology B 29(1).
Abstract
Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3527080]
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
in
Journal of Vacuum Science & Technology B
volume
29
issue
1
publisher
A V S Amer Inst Physics
conference name
54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
external identifiers
  • wos:000286679400024
  • scopus:79551616356
ISSN
1071-1023
1520-8567
DOI
10.1116/1.3527080
language
English
LU publication?
yes
id
2a617eaf-5008-4928-b4f3-65b8db10c2f1 (old id 1872710)
date added to LUP
2011-04-26 14:55:17
date last changed
2017-04-16 03:00:38
@inproceedings{2a617eaf-5008-4928-b4f3-65b8db10c2f1,
  abstract     = {Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro- and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3527080]},
  author       = {Forchheimer, Daniel and Luo, Gang and Ye, Lei and Montelius, Lars},
  booktitle    = {Journal of Vacuum Science & Technology B},
  issn         = {1071-1023},
  language     = {eng},
  number       = {1},
  publisher    = {A V S Amer Inst Physics},
  title        = {Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture},
  url          = {http://dx.doi.org/10.1116/1.3527080},
  volume       = {29},
  year         = {2011},
}