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Ru(0001) model catalyst under oxidizing and reducing reaction conditions: in-situ high-pressure surface X-ray diffraction study

He, YB; Knapp, M; Lundgren, Edvin LU and Over, H (2005) In The Journal of Physical Chemistry Part B 109(46). p.21825-21830
Abstract
With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ the oxidation of the Ru(0001) model catalyst under various reaction conditions, starting from a strongly oxidizing environment to reaction conditions typical for CO oxidation. With a mixture Of O-2 and CO (stoichiometry, 2:1) the partial pressure of oxygen has to be increased to 20 mbar to form the catalytically active RuO2(110) oxide film, while in pure oxygen environment a pressure of 10(-5) mbar is already sufficient to oxidize the Ru(0001) surface. For preparation temperatures in the range of 550-630 K a self-limiting RUO2(110) film is produced with a thickness of 1.6 nm. The RuO2(110) film grows self-acceleratedly after an induction... (More)
With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ the oxidation of the Ru(0001) model catalyst under various reaction conditions, starting from a strongly oxidizing environment to reaction conditions typical for CO oxidation. With a mixture Of O-2 and CO (stoichiometry, 2:1) the partial pressure of oxygen has to be increased to 20 mbar to form the catalytically active RuO2(110) oxide film, while in pure oxygen environment a pressure of 10(-5) mbar is already sufficient to oxidize the Ru(0001) surface. For preparation temperatures in the range of 550-630 K a self-limiting RUO2(110) film is produced with a thickness of 1.6 nm. The RuO2(110) film grows self-acceleratedly after an induction period. The RuO2 films on Ru(0001) can readily be reduced by H-2 and CO exposures at 415 K, without an induction period. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
The Journal of Physical Chemistry Part B
volume
109
issue
46
pages
21825 - 21830
publisher
The American Chemical Society
external identifiers
  • wos:000233437100051
  • scopus:28944442275
ISSN
1520-5207
DOI
10.1021/jp0538520
language
English
LU publication?
yes
id
087153dc-dc5e-4a36-a02a-b2f211a2f827 (old id 212096)
date added to LUP
2007-08-23 16:09:16
date last changed
2017-09-24 04:26:59
@article{087153dc-dc5e-4a36-a02a-b2f211a2f827,
  abstract     = {With surface X-ray diffraction (SXRD) using a high-pressure reaction chamber we investigated in-situ the oxidation of the Ru(0001) model catalyst under various reaction conditions, starting from a strongly oxidizing environment to reaction conditions typical for CO oxidation. With a mixture Of O-2 and CO (stoichiometry, 2:1) the partial pressure of oxygen has to be increased to 20 mbar to form the catalytically active RuO2(110) oxide film, while in pure oxygen environment a pressure of 10(-5) mbar is already sufficient to oxidize the Ru(0001) surface. For preparation temperatures in the range of 550-630 K a self-limiting RUO2(110) film is produced with a thickness of 1.6 nm. The RuO2(110) film grows self-acceleratedly after an induction period. The RuO2 films on Ru(0001) can readily be reduced by H-2 and CO exposures at 415 K, without an induction period.},
  author       = {He, YB and Knapp, M and Lundgren, Edvin and Over, H},
  issn         = {1520-5207},
  language     = {eng},
  number       = {46},
  pages        = {21825--21830},
  publisher    = {The American Chemical Society},
  series       = {The Journal of Physical Chemistry Part B},
  title        = {Ru(0001) model catalyst under oxidizing and reducing reaction conditions: in-situ high-pressure surface X-ray diffraction study},
  url          = {http://dx.doi.org/10.1021/jp0538520},
  volume       = {109},
  year         = {2005},
}