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Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source

Malmqvist, L; Bogdanov, A. L; Montelius, Lars LU and Hertz, H. M (1997) In Journal of Vacuum Science and Technology B 15(4). p.814-817
Abstract
A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers... (More)
A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers resulting in projected exposure times of similar to 10 s. (C) 1997 American Vacuum Society. (Less)
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organization
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type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology B
volume
15
issue
4
pages
814 - 817
publisher
American Institute of Physics
external identifiers
  • scopus:0031189166
ISSN
1520-8567
DOI
10.1116/1.589490
language
English
LU publication?
yes
id
acda478b-427a-411e-9ac1-c49b5e9f4572 (old id 2258949)
date added to LUP
2012-02-17 23:21:39
date last changed
2017-01-01 05:12:05
@article{acda478b-427a-411e-9ac1-c49b5e9f4572,
  abstract     = {A compact laser-plasma proximity x-ray lithography system suitable for laboratory-scale low-volume nanometer patterning is presented. The laser-plasma source, which is based on a fluorocarbon liquid-jet target, generates high-brightness lambda = 1.2-1.7 nm x-ray emission with only negligible debris production. The Au/SiNx x-ray mask is fabricated by employing ion milling and a high-contrast e-beam resist. With SAL-601 chemically enhanced resist we demonstrate fabrication of high-aspect-ratio, sub-100 nm structures. The exposure time is currently 20 min using a compact 10 Hz, lambda = 532 nm, 70 mJ/pulse mode-locked Nd:YAG laser. However, the regenerative liquid-jet target is designed for operation with future, e.g., 1000 Hz, lasers resulting in projected exposure times of similar to 10 s. (C) 1997 American Vacuum Society.},
  author       = {Malmqvist, L and Bogdanov, A. L and Montelius, Lars and Hertz, H. M},
  issn         = {1520-8567},
  language     = {eng},
  number       = {4},
  pages        = {814--817},
  publisher    = {American Institute of Physics},
  series       = {Journal of Vacuum Science and Technology B},
  title        = {Nanometer table-top proximity x-ray lithography with liquid-target laser-plasma source},
  url          = {http://dx.doi.org/10.1116/1.589490},
  volume       = {15},
  year         = {1997},
}