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Beaming effect of optical near-field in multiple metallic slits with nanometric linewidth and micrometer pitch

Wei, P K; Chou, H L; Cheng, Y R; Wei, C H; Fann, W and Tegenfeldt, Jonas LU (2005) In Optics Communications 253(1-3). p.198-204
Abstract
The beaming effect and interference patterns on the exit surface of multiple nano metallic slits with micrometer pitch were observed by scanning near-field optical microscopy. The near-field light intensity for multiple slits had a longer propagation tail and a smaller diverging angle as compared to that in a single slit. From finite-difference time-domain calculations, we verify that these fringe patterns come from the interference effect of longitudinal electric field, which is propagating along the surface. The beaming light in the slit openings is also attributed to the addition of longitudinal fields.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
near-field scanning optical microscopes
in
Optics Communications
volume
253
issue
1-3
pages
198 - 204
publisher
Elsevier
external identifiers
  • wos:000231519600025
  • scopus:23844442826
ISSN
0030-4018
DOI
10.1016/j.optcom.2005.04.041
language
English
LU publication?
yes
id
b5bd70ad-7f4b-4b95-b2d9-7a6653466103 (old id 226194)
date added to LUP
2007-08-07 09:36:59
date last changed
2017-01-01 07:19:03
@article{b5bd70ad-7f4b-4b95-b2d9-7a6653466103,
  abstract     = {The beaming effect and interference patterns on the exit surface of multiple nano metallic slits with micrometer pitch were observed by scanning near-field optical microscopy. The near-field light intensity for multiple slits had a longer propagation tail and a smaller diverging angle as compared to that in a single slit. From finite-difference time-domain calculations, we verify that these fringe patterns come from the interference effect of longitudinal electric field, which is propagating along the surface. The beaming light in the slit openings is also attributed to the addition of longitudinal fields.},
  author       = {Wei, P K and Chou, H L and Cheng, Y R and Wei, C H and Fann, W and Tegenfeldt, Jonas},
  issn         = {0030-4018},
  keyword      = {near-field scanning optical microscopes},
  language     = {eng},
  number       = {1-3},
  pages        = {198--204},
  publisher    = {Elsevier},
  series       = {Optics Communications},
  title        = {Beaming effect of optical near-field in multiple metallic slits with nanometric linewidth and micrometer pitch},
  url          = {http://dx.doi.org/10.1016/j.optcom.2005.04.041},
  volume       = {253},
  year         = {2005},
}