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Direct Current Accelerators for Industrial Applications

Hellborg, Ragnar LU and Whitlow, Harry J LU (2011) In Reviews of Accelerator Science and Technology 4(1). p.183-212
Abstract (Swedish)
Abstract in Undetermined

Direct current accelerators form the basis of many front-line industrial processes. They have many advantages that have kept them at the forefront of technology for many decades, such as a small and easily managed environmental footprint. In this article, the basic principles of the different subsystems (ion and electron sources, high voltage generation, control, etc.) are overviewed. Some well-known (ion implantation and polymer processing) and lesser-known (electron beam lithography and particle-induced X-ray aerosol mapping) applications are reviewed.
Please use this url to cite or link to this publication:
author
and
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
isotope production, sterilization, electron beam lithography, neutron generators, electron beam sterilization, electron beam polymer processing, Particle accelerators, ion sources, electron sources, electron microscopy, high voltage terminal, ion beam analysis, ion implantation
in
Reviews of Accelerator Science and Technology
volume
4
issue
1
pages
183 - 212
publisher
World Scientific Publishing
external identifiers
  • scopus:85050228077
ISSN
1793-8058
DOI
10.1142/S1793626811000525
language
English
LU publication?
yes
id
3d9bdce5-1c2d-4b6c-8aed-0377cfdba16f (old id 2278166)
alternative location
http://www.worldscinet.com/rast/04/0401/S1793626811000525.html
date added to LUP
2016-04-01 10:07:53
date last changed
2021-08-25 03:04:47
@article{3d9bdce5-1c2d-4b6c-8aed-0377cfdba16f,
  abstract     = {<b>Abstract in Undetermined</b><br/><br>
Direct current accelerators form the basis of many front-line industrial processes. They have many advantages that have kept them at the forefront of technology for many decades, such as a small and easily managed environmental footprint. In this article, the basic principles of the different subsystems (ion and electron sources, high voltage generation, control, etc.) are overviewed. Some well-known (ion implantation and polymer processing) and lesser-known (electron beam lithography and particle-induced X-ray aerosol mapping) applications are reviewed.},
  author       = {Hellborg, Ragnar and Whitlow, Harry J},
  issn         = {1793-8058},
  language     = {eng},
  number       = {1},
  pages        = {183--212},
  publisher    = {World Scientific Publishing},
  series       = {Reviews of Accelerator Science and Technology},
  title        = {Direct Current Accelerators for Industrial Applications},
  url          = {http://dx.doi.org/10.1142/S1793626811000525},
  doi          = {10.1142/S1793626811000525},
  volume       = {4},
  year         = {2011},
}