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Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography

Keil, M; Beck, Marc LU ; Ling, T G I; Graczyk, Mariusz LU ; Montelius, Lars LU and Heidari, B (2005) In Journal of Vacuum Science and Technology B 23(2). p.575-584
Abstract
In this study we will report on the development of a process to establish antisticking layers on nickel-based stamps, which are used in several industrial applications of nanoimprint lithography or related methods. The fluorinated alkyl silane films have been deposited onto different Ni-based stamp surfaces in order to minimize the adhesion tendency at the stamp/polymer interface. film thickness, chemical composition, purity, and binding mechanisms of the silane groups to different stamp surface materials have been determined by photoelectron spectroscopy (XPS). In the case of electroplated nickel stamps-where low imprint qualities are observed-multilayer thick films cover, the stamp surfaces, consisting of polymerized, cross-linked alkyl... (More)
In this study we will report on the development of a process to establish antisticking layers on nickel-based stamps, which are used in several industrial applications of nanoimprint lithography or related methods. The fluorinated alkyl silane films have been deposited onto different Ni-based stamp surfaces in order to minimize the adhesion tendency at the stamp/polymer interface. film thickness, chemical composition, purity, and binding mechanisms of the silane groups to different stamp surface materials have been determined by photoelectron spectroscopy (XPS). In the case of electroplated nickel stamps-where low imprint qualities are observed-multilayer thick films cover, the stamp surfaces, consisting of polymerized, cross-linked alkyl silanes, which are poorly bound to the surface. In order to overcome these restrictions a. 100 angstrom thick polycrystalline titanium layer has been established in a sandwich position between the nickel substrate and the silane film. Here, silane film thicknesses in the monomolecular region together with evidences for strong covalent linkage between the silane groups and the oxidized Ti surface can be concluded from the XPS results, leading to film properties and imprint qualities, which are comparable to those formerly observed for silicon stamps. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology B
volume
23
issue
2
pages
575 - 584
publisher
American Institute of Physics
external identifiers
  • wos:000228788600040
  • scopus:31144450489
ISSN
1520-8567
DOI
10.1116/1.1880292
language
English
LU publication?
yes
id
a5df8e43-cb3a-4b74-bcbf-bb6f9d49121a (old id 243656)
date added to LUP
2007-08-09 15:34:03
date last changed
2017-04-16 03:27:49
@article{a5df8e43-cb3a-4b74-bcbf-bb6f9d49121a,
  abstract     = {In this study we will report on the development of a process to establish antisticking layers on nickel-based stamps, which are used in several industrial applications of nanoimprint lithography or related methods. The fluorinated alkyl silane films have been deposited onto different Ni-based stamp surfaces in order to minimize the adhesion tendency at the stamp/polymer interface. film thickness, chemical composition, purity, and binding mechanisms of the silane groups to different stamp surface materials have been determined by photoelectron spectroscopy (XPS). In the case of electroplated nickel stamps-where low imprint qualities are observed-multilayer thick films cover, the stamp surfaces, consisting of polymerized, cross-linked alkyl silanes, which are poorly bound to the surface. In order to overcome these restrictions a. 100 angstrom thick polycrystalline titanium layer has been established in a sandwich position between the nickel substrate and the silane film. Here, silane film thicknesses in the monomolecular region together with evidences for strong covalent linkage between the silane groups and the oxidized Ti surface can be concluded from the XPS results, leading to film properties and imprint qualities, which are comparable to those formerly observed for silicon stamps.},
  author       = {Keil, M and Beck, Marc and Ling, T G I and Graczyk, Mariusz and Montelius, Lars and Heidari, B},
  issn         = {1520-8567},
  language     = {eng},
  number       = {2},
  pages        = {575--584},
  publisher    = {American Institute of Physics},
  series       = {Journal of Vacuum Science and Technology B},
  title        = {Development and characterization of silane antisticking layers on nickel-based stamps designed for nanoimprint lithography},
  url          = {http://dx.doi.org/10.1116/1.1880292},
  volume       = {23},
  year         = {2005},
}