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Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography

Keil, M; Beck, Marc LU ; Frennesson, G; Theander, E; Bolmsjo, E; Montelius, Lars LU and Heidari, B (2004) In Journal of Vacuum Science and Technology B 22(6). p.3283-3287
Abstract
Thin films of different derivatives of fluorinated alkyl phosphoric acids have been deposited from aqueous solutions onto surfaces of oxidized polycrystalline nickel stamps. which are commonly used in several industrial applications of nanoimprint lithography (NIL). The films have been established in order to increase the antiadhesion tendencies at the stamp polymer interface. Thicknesses, chemical compositions, and purities of the films as well as binding mechanisms to the stamp surfaces have been determined by photoelectron spectroscopy (XPS). The results demonstrate the adsorption of highly pure films having thicknesses in the monomolecular region, whose chemical compositions are characterized by large ratios of fluorinated to... (More)
Thin films of different derivatives of fluorinated alkyl phosphoric acids have been deposited from aqueous solutions onto surfaces of oxidized polycrystalline nickel stamps. which are commonly used in several industrial applications of nanoimprint lithography (NIL). The films have been established in order to increase the antiadhesion tendencies at the stamp polymer interface. Thicknesses, chemical compositions, and purities of the films as well as binding mechanisms to the stamp surfaces have been determined by photoelectron spectroscopy (XPS). The results demonstrate the adsorption of highly pure films having thicknesses in the monomolecular region, whose chemical compositions are characterized by large ratios of fluorinated to nonfluorinated carbon species. The high ionic nature of Ni-oxide benefits strong ionic linkages between the phosphate groups of the fluorinated antisticking film and the stamp surface, allowing a large-scale production of imprints with patterned stamps having feature sizes down to 100 nm. (C) 2004 American Vacuum Society. (Less)
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organization
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type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology B
volume
22
issue
6
pages
3283 - 3287
publisher
American Institute of Physics
external identifiers
  • wos:000226439800139
  • scopus:13244273823
ISSN
1520-8567
DOI
10.1116/1.1824051
language
English
LU publication?
yes
id
811be80f-9028-47d0-9321-583fb60480b2 (old id 255179)
date added to LUP
2007-10-23 18:09:16
date last changed
2017-01-01 04:56:14
@article{811be80f-9028-47d0-9321-583fb60480b2,
  abstract     = {Thin films of different derivatives of fluorinated alkyl phosphoric acids have been deposited from aqueous solutions onto surfaces of oxidized polycrystalline nickel stamps. which are commonly used in several industrial applications of nanoimprint lithography (NIL). The films have been established in order to increase the antiadhesion tendencies at the stamp polymer interface. Thicknesses, chemical compositions, and purities of the films as well as binding mechanisms to the stamp surfaces have been determined by photoelectron spectroscopy (XPS). The results demonstrate the adsorption of highly pure films having thicknesses in the monomolecular region, whose chemical compositions are characterized by large ratios of fluorinated to nonfluorinated carbon species. The high ionic nature of Ni-oxide benefits strong ionic linkages between the phosphate groups of the fluorinated antisticking film and the stamp surface, allowing a large-scale production of imprints with patterned stamps having feature sizes down to 100 nm. (C) 2004 American Vacuum Society.},
  author       = {Keil, M and Beck, Marc and Frennesson, G and Theander, E and Bolmsjo, E and Montelius, Lars and Heidari, B},
  issn         = {1520-8567},
  language     = {eng},
  number       = {6},
  pages        = {3283--3287},
  publisher    = {American Institute of Physics},
  series       = {Journal of Vacuum Science and Technology B},
  title        = {Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography},
  url          = {http://dx.doi.org/10.1116/1.1824051},
  volume       = {22},
  year         = {2004},
}