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Polarization dependence of light intensity distribution near a nanometric aluminum slit

Wei, CH; Tsao, PH; Farm, W; Wei, PK; Tegenfeldt, Jonas LU and Austin, RH (2004) In Optical Society of America. Journal B: Optical Physics 21(5). p.1005-1012
Abstract
The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes. (C) 2004 Optical Society of America.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Optical Society of America. Journal B: Optical Physics
volume
21
issue
5
pages
1005 - 1012
publisher
Optical Society of America
external identifiers
  • wos:000221234800018
  • scopus:10044294969
ISSN
0740-3224
language
English
LU publication?
yes
id
a365c475-2500-4d97-a2c1-a06d35b711ea (old id 279309)
alternative location
http://www.opticsinfobase.org/abstract.cfm?URI=josab-21-5-1005
date added to LUP
2007-11-05 12:43:22
date last changed
2017-10-22 04:29:27
@article{a365c475-2500-4d97-a2c1-a06d35b711ea,
  abstract     = {The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes. (C) 2004 Optical Society of America.},
  author       = {Wei, CH and Tsao, PH and Farm, W and Wei, PK and Tegenfeldt, Jonas and Austin, RH},
  issn         = {0740-3224},
  language     = {eng},
  number       = {5},
  pages        = {1005--1012},
  publisher    = {Optical Society of America},
  series       = {Optical Society of America. Journal B: Optical Physics},
  title        = {Polarization dependence of light intensity distribution near a nanometric aluminum slit},
  volume       = {21},
  year         = {2004},
}