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Colloidal lithography for fabricating patterned polymer-brush microstructures

Chen, Tao; Chang, Debby LU ; Jordan, Rainer and Zauscher, Stefan (2012) In Beilstein Journal of Nanotechnology 3. p.397-403
Abstract
We exploit a series of robust, but simple and convenient colloidal lithography (CL) approaches, using a microsphere array as a mask or as a guiding template, and combine this with surface-initiated atom-transfer radical polymerization (SI-ATRP) to fabricate patterned polymer-brush microstructures. The advantages of the CL technique over other lithographic approaches for the fabrication of patterned polymer brushes are (i) that it can be carried out with commercially available colloidal particles at a relatively low cost, (ii) that no complex equipment is required to create the patterned templates with micro-and nanoscale features, and (iii) that polymer brush features are controlled simply by changing the size or chemical functionality of... (More)
We exploit a series of robust, but simple and convenient colloidal lithography (CL) approaches, using a microsphere array as a mask or as a guiding template, and combine this with surface-initiated atom-transfer radical polymerization (SI-ATRP) to fabricate patterned polymer-brush microstructures. The advantages of the CL technique over other lithographic approaches for the fabrication of patterned polymer brushes are (i) that it can be carried out with commercially available colloidal particles at a relatively low cost, (ii) that no complex equipment is required to create the patterned templates with micro-and nanoscale features, and (iii) that polymer brush features are controlled simply by changing the size or chemical functionality of the microspheres or the substrate. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
atom-transfer radical polymerization, colloidal lithography, patterning, self-assembled microsphere monolayer
in
Beilstein Journal of Nanotechnology
volume
3
pages
397 - 403
publisher
Beilstein-Institut
external identifiers
  • wos:000304041000001
  • scopus:84861399076
ISSN
2190-4286
DOI
10.3762/bjnano.3.46
language
English
LU publication?
yes
id
e62ac6ce-2a17-455a-b7e1-68127685f764 (old id 2826527)
date added to LUP
2012-06-20 14:46:32
date last changed
2017-07-23 04:13:07
@article{e62ac6ce-2a17-455a-b7e1-68127685f764,
  abstract     = {We exploit a series of robust, but simple and convenient colloidal lithography (CL) approaches, using a microsphere array as a mask or as a guiding template, and combine this with surface-initiated atom-transfer radical polymerization (SI-ATRP) to fabricate patterned polymer-brush microstructures. The advantages of the CL technique over other lithographic approaches for the fabrication of patterned polymer brushes are (i) that it can be carried out with commercially available colloidal particles at a relatively low cost, (ii) that no complex equipment is required to create the patterned templates with micro-and nanoscale features, and (iii) that polymer brush features are controlled simply by changing the size or chemical functionality of the microspheres or the substrate.},
  author       = {Chen, Tao and Chang, Debby and Jordan, Rainer and Zauscher, Stefan},
  issn         = {2190-4286},
  keyword      = {atom-transfer radical polymerization,colloidal lithography,patterning,self-assembled microsphere monolayer},
  language     = {eng},
  pages        = {397--403},
  publisher    = {Beilstein-Institut},
  series       = {Beilstein Journal of Nanotechnology},
  title        = {Colloidal lithography for fabricating patterned polymer-brush microstructures},
  url          = {http://dx.doi.org/10.3762/bjnano.3.46},
  volume       = {3},
  year         = {2012},
}