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Ultrathin Co films on flat and vicinal Cu(111) surfaces: per atom determination of orbital and spin moments

Hahlin, A; Hunter Dunn, Jonathan LU ; Karis, O; Poulopoulos, P; Nunthel, R; Lindner, J and Arvanitis, D (2003) 281st Wilhelm and Else Heraeus Seminar In Journal of Physics: Condensed Matter 15(5). p.573-586
Abstract
We have performed x-ray magnetic circular dichroism, x-ray resonant magnetic scattering and scanning tunnelling microscopy measurements on ultrathin Co films deposited on flat and vicinal Cu(111). The range of film thickness varies between one and 25 monolayers. For the vicinal Cu(111), Co deposition below one monolayer leads to the formation of elongated islands preferentially oriented along the step edges. These islands extend over lateral length scales of up to several thousand angstroms. For the thicker films we still observe that the vicinal surface leads to the occurrence of a preferential uniaxial growth direction. No such preferential growth direction can be identified for the flat surface. In correlation to the Co growth we... (More)
We have performed x-ray magnetic circular dichroism, x-ray resonant magnetic scattering and scanning tunnelling microscopy measurements on ultrathin Co films deposited on flat and vicinal Cu(111). The range of film thickness varies between one and 25 monolayers. For the vicinal Cu(111), Co deposition below one monolayer leads to the formation of elongated islands preferentially oriented along the step edges. These islands extend over lateral length scales of up to several thousand angstroms. For the thicker films we still observe that the vicinal surface leads to the occurrence of a preferential uniaxial growth direction. No such preferential growth direction can be identified for the flat surface. In correlation to the Co growth we observe an increase of both the orbital and the spin moment per Co atom on vicinal Cu(111) of about 25% versus what was observed for Co on flat Cu(111). This enhancement is observed in both the x-ray absorption and the reflectivity measurements. Similar to what was earlier reported for Co on Cu(100) we also observe for the case Co on Cu(111) an increase in the ratio m(l)/m(s), (orbital to spin moments) of 40% for thin Co films. In contrast to what has been reported for Co films on flat and vicinal Cu(100) we do not observe any major variations in the occupancy of the Co 3d states for Co grown on the vicinal Cu(111) surface. (Less)
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author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
in
Journal of Physics: Condensed Matter
volume
15
issue
5
pages
573 - 586
publisher
IOP Publishing
conference name
281st Wilhelm and Else Heraeus Seminar
external identifiers
  • wos:000181618200012
  • scopus:0037433299
ISSN
0953-8984
DOI
10.1088/0953-8984/15/5/311
language
English
LU publication?
yes
id
a8af9f9b-eb6b-4a56-b70a-e7fae607f21f (old id 315716)
date added to LUP
2007-09-03 13:56:11
date last changed
2018-05-29 11:49:24
@inproceedings{a8af9f9b-eb6b-4a56-b70a-e7fae607f21f,
  abstract     = {We have performed x-ray magnetic circular dichroism, x-ray resonant magnetic scattering and scanning tunnelling microscopy measurements on ultrathin Co films deposited on flat and vicinal Cu(111). The range of film thickness varies between one and 25 monolayers. For the vicinal Cu(111), Co deposition below one monolayer leads to the formation of elongated islands preferentially oriented along the step edges. These islands extend over lateral length scales of up to several thousand angstroms. For the thicker films we still observe that the vicinal surface leads to the occurrence of a preferential uniaxial growth direction. No such preferential growth direction can be identified for the flat surface. In correlation to the Co growth we observe an increase of both the orbital and the spin moment per Co atom on vicinal Cu(111) of about 25% versus what was observed for Co on flat Cu(111). This enhancement is observed in both the x-ray absorption and the reflectivity measurements. Similar to what was earlier reported for Co on Cu(100) we also observe for the case Co on Cu(111) an increase in the ratio m(l)/m(s), (orbital to spin moments) of 40% for thin Co films. In contrast to what has been reported for Co films on flat and vicinal Cu(100) we do not observe any major variations in the occupancy of the Co 3d states for Co grown on the vicinal Cu(111) surface.},
  author       = {Hahlin, A and Hunter Dunn, Jonathan and Karis, O and Poulopoulos, P and Nunthel, R and Lindner, J and Arvanitis, D},
  booktitle    = {Journal of Physics: Condensed Matter},
  issn         = {0953-8984},
  language     = {eng},
  number       = {5},
  pages        = {573--586},
  publisher    = {IOP Publishing},
  title        = {Ultrathin Co films on flat and vicinal Cu(111) surfaces: per atom determination of orbital and spin moments},
  url          = {http://dx.doi.org/10.1088/0953-8984/15/5/311},
  volume       = {15},
  year         = {2003},
}