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Low Temperature CVD of Thin, Amorphous Boron-Carbon Films for Neutron Detectors

Pedersen, Henrik; Höglund, Carina LU ; Birch, Jens; Jensen, Jens and Henry, Anne (2012) In Chemical Vapor Deposition 18(7-9). p.221-224
Abstract
Thin, amorphous boron-carbon films are deposited at low temperature (400600?degrees C) by thermally activated CVD using the organoborane triethylboron (TEB) as a single precursor. Two different carrier gases are tested. At 600?degrees C, using argon as the carrier gas, the deposition rate is close to 1?mu m h-1. The film has a density of 2.14?g?cm-3 with a B/C ratio of 3.7. When hydrogen is used as the carrier gas, the film density is 2.42?g?cm-3, the B/C ratio 4.6, and the deposition rate 0.35?mu m h-1. The hydrogen content in the films is about 34 at.-%, regardless of ambient conditions during deposition, and varies only with the deposition temperature. In addition, both the film composition and the film density are found to vary... (More)
Thin, amorphous boron-carbon films are deposited at low temperature (400600?degrees C) by thermally activated CVD using the organoborane triethylboron (TEB) as a single precursor. Two different carrier gases are tested. At 600?degrees C, using argon as the carrier gas, the deposition rate is close to 1?mu m h-1. The film has a density of 2.14?g?cm-3 with a B/C ratio of 3.7. When hydrogen is used as the carrier gas, the film density is 2.42?g?cm-3, the B/C ratio 4.6, and the deposition rate 0.35?mu m h-1. The hydrogen content in the films is about 34 at.-%, regardless of ambient conditions during deposition, and varies only with the deposition temperature. In addition, both the film composition and the film density are found to vary significantly with the deposition temperature and the atmospheric conditions. Based upon these results, a deposition mechanism for the growth of boron-carbon films from TEB, where the TEB molecule is decomposed to BH3 and hydrocarbons, is suggested. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Boron-carbon films, Elastic recoil detection analysis (ERDA), Low, temperature CVD, Neutron detection, Organoborane
in
Chemical Vapor Deposition
volume
18
issue
7-9
pages
221 - 224
publisher
Wiley-Blackwell
external identifiers
  • wos:000308400900009
  • scopus:84865968966
ISSN
1521-3862
DOI
10.1002/cvde.201206980
language
English
LU publication?
yes
id
b1481ff1-0ed5-4892-b917-2732979d1081 (old id 3191254)
date added to LUP
2012-12-03 15:35:11
date last changed
2017-01-01 03:48:34
@article{b1481ff1-0ed5-4892-b917-2732979d1081,
  abstract     = {Thin, amorphous boron-carbon films are deposited at low temperature (400600?degrees C) by thermally activated CVD using the organoborane triethylboron (TEB) as a single precursor. Two different carrier gases are tested. At 600?degrees C, using argon as the carrier gas, the deposition rate is close to 1?mu m h-1. The film has a density of 2.14?g?cm-3 with a B/C ratio of 3.7. When hydrogen is used as the carrier gas, the film density is 2.42?g?cm-3, the B/C ratio 4.6, and the deposition rate 0.35?mu m h-1. The hydrogen content in the films is about 34 at.-%, regardless of ambient conditions during deposition, and varies only with the deposition temperature. In addition, both the film composition and the film density are found to vary significantly with the deposition temperature and the atmospheric conditions. Based upon these results, a deposition mechanism for the growth of boron-carbon films from TEB, where the TEB molecule is decomposed to BH3 and hydrocarbons, is suggested.},
  author       = {Pedersen, Henrik and Höglund, Carina and Birch, Jens and Jensen, Jens and Henry, Anne},
  issn         = {1521-3862},
  keyword      = {Boron-carbon films,Elastic recoil detection analysis (ERDA),Low,temperature CVD,Neutron detection,Organoborane},
  language     = {eng},
  number       = {7-9},
  pages        = {221--224},
  publisher    = {Wiley-Blackwell},
  series       = {Chemical Vapor Deposition},
  title        = {Low Temperature CVD of Thin, Amorphous Boron-Carbon Films for Neutron Detectors},
  url          = {http://dx.doi.org/10.1002/cvde.201206980},
  volume       = {18},
  year         = {2012},
}