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Nanoimprinted passive optical devices

Seekamp, J; Zankovych, S; Helfer, AH; Maury, P; Torres, CMS; Bottger, G; Liguda, C; Eich, M; Heidari, B and Montelius, Lars LU , et al. (2002) In Nanotechnology 13(5). p.581-586
Abstract
We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm(-1) at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were... (More)
We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm(-1) at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp. (Less)
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publication status
published
subject
in
Nanotechnology
volume
13
issue
5
pages
581 - 586
publisher
IOP Publishing
external identifiers
  • wos:000179070200009
  • scopus:18644386140
ISSN
0957-4484
DOI
10.1088/0957-4484/13/5/307
language
English
LU publication?
yes
id
89f8380a-3668-4624-b98d-31e64d5d4cfb (old id 324386)
date added to LUP
2007-11-13 14:23:52
date last changed
2017-01-01 05:13:41
@article{89f8380a-3668-4624-b98d-31e64d5d4cfb,
  abstract     = {We report on the feasibility and process parameters of nanoimprint lithography to fabricate low refractive index passive optical devices. Diffraction gratings printed in polymethylmethacrylate (PMMA) exhibit a sharp dispersion with a full width at half maximum of about 20 nm. Waveguides were printed in polystyrene (PS) on silicon oxide and had losses between 8-20 dB cm(-1) at wavelengths between 650-400 nm, respectively. Finally, one-dimensional photonic structures were also printed in PS and their transmission and morphology characterized. The expected Bragg peak was observed in transmission and atomic force microscopy images have shown a good pattern transfer. A square lattice was printed in PMMA and more than 40 print cycles were obtained, i.e., potentially more than 1000 imprints from one master stamp.},
  author       = {Seekamp, J and Zankovych, S and Helfer, AH and Maury, P and Torres, CMS and Bottger, G and Liguda, C and Eich, M and Heidari, B and Montelius, Lars and Ahopelto, J},
  issn         = {0957-4484},
  language     = {eng},
  number       = {5},
  pages        = {581--586},
  publisher    = {IOP Publishing},
  series       = {Nanotechnology},
  title        = {Nanoimprinted passive optical devices},
  url          = {http://dx.doi.org/10.1088/0957-4484/13/5/307},
  volume       = {13},
  year         = {2002},
}