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GaAs nanopillar arrays with suppressed broadband reflectance and high optical quality for photovoltaic applications

Sanatinia, R.; Awan, K. M.; Naureen, S.; Anttu, Nicklas LU ; Ebraert, E. and Anand, S. (2012) In Optical Materials Express 2(11). p.1671-1679
Abstract
We report on fabrication and optical characterization of GaAs nanopillar (NP) arrays, obtained using a combination of low-cost mask generation by self-assembled silica particles (nanosphere lithography) and dry etching. Tapered structures (conical and frustum NP arrays) are fabricated by appropriate optimization of process parameters. Significant suppression of surface reflectance is observed for both geometries over a broad wavelength range. Simulations, based on finite difference time domain (FDTD) method, show good agreement with reflectivity measurements and serve as a guideline for design of NPs and understanding their interaction with light. A combination of wet chemical etching and sulfur-based passivation of GaAs NPs, results in... (More)
We report on fabrication and optical characterization of GaAs nanopillar (NP) arrays, obtained using a combination of low-cost mask generation by self-assembled silica particles (nanosphere lithography) and dry etching. Tapered structures (conical and frustum NP arrays) are fabricated by appropriate optimization of process parameters. Significant suppression of surface reflectance is observed for both geometries over a broad wavelength range. Simulations, based on finite difference time domain (FDTD) method, show good agreement with reflectivity measurements and serve as a guideline for design of NPs and understanding their interaction with light. A combination of wet chemical etching and sulfur-based passivation of GaAs NPs, results in more than one order of magnitude enhancement in PL intensity and recovery of PL line-width, which is very promising for photovoltaic applications. (C) 2012 Optical Society of America (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Optical Materials Express
volume
2
issue
11
pages
1671 - 1679
publisher
Optical Society of America
external identifiers
  • wos:000310647500023
  • scopus:84870370508
ISSN
2159-3930
DOI
10.1364/OME.2.001671
language
English
LU publication?
yes
id
8876e30e-3cb3-4ebe-9dc3-b9fd5d724b9f (old id 3259652)
date added to LUP
2012-12-20 15:17:26
date last changed
2017-08-27 04:43:08
@article{8876e30e-3cb3-4ebe-9dc3-b9fd5d724b9f,
  abstract     = {We report on fabrication and optical characterization of GaAs nanopillar (NP) arrays, obtained using a combination of low-cost mask generation by self-assembled silica particles (nanosphere lithography) and dry etching. Tapered structures (conical and frustum NP arrays) are fabricated by appropriate optimization of process parameters. Significant suppression of surface reflectance is observed for both geometries over a broad wavelength range. Simulations, based on finite difference time domain (FDTD) method, show good agreement with reflectivity measurements and serve as a guideline for design of NPs and understanding their interaction with light. A combination of wet chemical etching and sulfur-based passivation of GaAs NPs, results in more than one order of magnitude enhancement in PL intensity and recovery of PL line-width, which is very promising for photovoltaic applications. (C) 2012 Optical Society of America},
  author       = {Sanatinia, R. and Awan, K. M. and Naureen, S. and Anttu, Nicklas and Ebraert, E. and Anand, S.},
  issn         = {2159-3930},
  language     = {eng},
  number       = {11},
  pages        = {1671--1679},
  publisher    = {Optical Society of America},
  series       = {Optical Materials Express},
  title        = {GaAs nanopillar arrays with suppressed broadband reflectance and high optical quality for photovoltaic applications},
  url          = {http://dx.doi.org/10.1364/OME.2.001671},
  volume       = {2},
  year         = {2012},
}