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Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process

Schneider, A; Su, B; Button, TW; Singleton, L; Wilhelmi, Oliver LU ; Huq, SE; Prewett, PD and Lawes, RA (2002) In Microsystem Technologies: Micro- and Nanosystems Information Storage and Processing Systems 8(2-3). p.88-92
Abstract
In this paper results are presented from a range of experiments to explore the feasibility of inserting a ceramic material PZT (lead zirconium titanate) into different kinds of high-aspect-ratio resist moulds. Polymethylmethacrylate (PMMA) and SU-8 on silicon substrates and free-standing SU-8 membranes with microcavities or through-holes (defined by X-ray lithography) have been used as moulding medium. Processing conditions for the resist materials including pre-bake, exposure, post-bake, development and stripping have been compared. The advantages of different types of resist mould for the LIGA process has been evaluated. Additionally a comparison of photosensitivity of PMMA and SU-8 has been carried out. Using a range of load pressures... (More)
In this paper results are presented from a range of experiments to explore the feasibility of inserting a ceramic material PZT (lead zirconium titanate) into different kinds of high-aspect-ratio resist moulds. Polymethylmethacrylate (PMMA) and SU-8 on silicon substrates and free-standing SU-8 membranes with microcavities or through-holes (defined by X-ray lithography) have been used as moulding medium. Processing conditions for the resist materials including pre-bake, exposure, post-bake, development and stripping have been compared. The advantages of different types of resist mould for the LIGA process has been evaluated. Additionally a comparison of photosensitivity of PMMA and SU-8 has been carried out. Using a range of load pressures (5 to 60 MPa), appropriate conditions for PZT embossing into resist moulds have been determined (ensuring minimum void formation in the final PZT structures). In the final form, SU-8 moulds have been removed by laser ablation. This is the first reporting of high-aspect-ratio ceramic microstructures fabricated using a combination of SU-8 moulds and PZT embossing. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Microsystem Technologies: Micro- and Nanosystems Information Storage and Processing Systems
volume
8
issue
2-3
pages
88 - 92
publisher
Springer
external identifiers
  • wos:000176303400005
  • scopus:0036575004
ISSN
1432-1858
DOI
10.1007/s00542-001-0141-y
language
English
LU publication?
yes
id
ec6cf73e-022d-477b-bbcd-a412f73d4cf4 (old id 334749)
date added to LUP
2007-11-09 10:48:25
date last changed
2017-01-01 05:11:47
@article{ec6cf73e-022d-477b-bbcd-a412f73d4cf4,
  abstract     = {In this paper results are presented from a range of experiments to explore the feasibility of inserting a ceramic material PZT (lead zirconium titanate) into different kinds of high-aspect-ratio resist moulds. Polymethylmethacrylate (PMMA) and SU-8 on silicon substrates and free-standing SU-8 membranes with microcavities or through-holes (defined by X-ray lithography) have been used as moulding medium. Processing conditions for the resist materials including pre-bake, exposure, post-bake, development and stripping have been compared. The advantages of different types of resist mould for the LIGA process has been evaluated. Additionally a comparison of photosensitivity of PMMA and SU-8 has been carried out. Using a range of load pressures (5 to 60 MPa), appropriate conditions for PZT embossing into resist moulds have been determined (ensuring minimum void formation in the final PZT structures). In the final form, SU-8 moulds have been removed by laser ablation. This is the first reporting of high-aspect-ratio ceramic microstructures fabricated using a combination of SU-8 moulds and PZT embossing.},
  author       = {Schneider, A and Su, B and Button, TW and Singleton, L and Wilhelmi, Oliver and Huq, SE and Prewett, PD and Lawes, RA},
  issn         = {1432-1858},
  language     = {eng},
  number       = {2-3},
  pages        = {88--92},
  publisher    = {Springer},
  series       = {Microsystem Technologies: Micro- and Nanosystems Information Storage and Processing Systems},
  title        = {Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process},
  url          = {http://dx.doi.org/10.1007/s00542-001-0141-y},
  volume       = {8},
  year         = {2002},
}