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Optimization of a self-closing effect to produce nanochannels with top slits in fused silica

Graczyk, Mariusz LU ; Balaz, Martina LU ; Kvennefors, Anders LU ; Linke, Heiner LU and Maximov, Ivan LU (2012) In Journal of Vacuum Science and Technology B 30(6).
Abstract
The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica... (More)
The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica substrate is used to create the initial slit before oxidation. The details of nanochannel fabrication steps are described and discussed. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766317] (Less)
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Contribution to journal
publication status
published
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in
Journal of Vacuum Science and Technology B
volume
30
issue
6
publisher
American Institute of Physics
external identifiers
  • wos:000311667300065
  • scopus:84870378917
ISSN
1520-8567
DOI
10.1116/1.4766317
language
English
LU publication?
yes
id
34bc07f7-dc53-46b5-8809-1d50464f8572 (old id 3373249)
date added to LUP
2013-01-31 11:15:39
date last changed
2017-08-27 03:38:37
@article{34bc07f7-dc53-46b5-8809-1d50464f8572,
  abstract     = {The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica substrate is used to create the initial slit before oxidation. The details of nanochannel fabrication steps are described and discussed. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766317]},
  articleno    = {06FF09},
  author       = {Graczyk, Mariusz and Balaz, Martina and Kvennefors, Anders and Linke, Heiner and Maximov, Ivan},
  issn         = {1520-8567},
  language     = {eng},
  number       = {6},
  publisher    = {American Institute of Physics},
  series       = {Journal of Vacuum Science and Technology B},
  title        = {Optimization of a self-closing effect to produce nanochannels with top slits in fused silica},
  url          = {http://dx.doi.org/10.1116/1.4766317},
  volume       = {30},
  year         = {2012},
}