Advanced

Study of thin oxide films by electron, ion and synchrotron radiation beams

Sammelselg, V; Rauhala, E; Arstila, K; Zakharov, Alexei LU ; Aarik, J; Kikas, A; Karlis, J; Tarre, A; Seppala, A and Asari, J, et al. (2002) In Mikrochimica Acta 139(1-4). p.165-169
Abstract
Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.
Please use this url to cite or link to this publication:
author
, et al. (More)
(Less)
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
oxide films, TOF-ERDA, RBS, scanning photoelectron microscopy, EPMA
in
Mikrochimica Acta
volume
139
issue
1-4
pages
165 - 169
publisher
Springer
external identifiers
  • wos:000175560300025
  • scopus:3843069070
ISSN
1436-5073
DOI
10.1007/s006040200056
language
English
LU publication?
yes
id
91cb6f1c-198c-4d28-ac2b-36ca93ce7029 (old id 337473)
date added to LUP
2007-11-09 09:37:29
date last changed
2017-01-01 04:39:36
@article{91cb6f1c-198c-4d28-ac2b-36ca93ce7029,
  abstract     = {Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.},
  author       = {Sammelselg, V and Rauhala, E and Arstila, K and Zakharov, Alexei and Aarik, J and Kikas, A and Karlis, J and Tarre, A and Seppala, A and Asari, J and Martinson, Indrek},
  issn         = {1436-5073},
  keyword      = {oxide films,TOF-ERDA,RBS,scanning photoelectron microscopy,EPMA},
  language     = {eng},
  number       = {1-4},
  pages        = {165--169},
  publisher    = {Springer},
  series       = {Mikrochimica Acta},
  title        = {Study of thin oxide films by electron, ion and synchrotron radiation beams},
  url          = {http://dx.doi.org/10.1007/s006040200056},
  volume       = {139},
  year         = {2002},
}