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Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps

Asif, Muhammad LU ; Graczyk, Mariusz LU ; Heidari, Babak and Maximov, Ivan LU (2022) In Micro and Nano Engineering 14.
Abstract
We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me­ chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano­ imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off... (More)
We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me­ chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano­ imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm. (Less)
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author
; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
nanoimprint stamps, UV-curable polymers, nanoimprint lithography, high resolution patterning
in
Micro and Nano Engineering
volume
14
article number
100118
pages
7 pages
publisher
Elsevier
external identifiers
  • scopus:85125490050
ISSN
2590-0072
DOI
10.1016/j.mne.2022.100118
language
English
LU publication?
yes
id
348de17c-bf60-4ff4-b432-5e2322b25609
date added to LUP
2022-04-06 09:35:08
date last changed
2023-11-14 08:11:43
@article{348de17c-bf60-4ff4-b432-5e2322b25609,
  abstract     = {{We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me­ chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano­ imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.}},
  author       = {{Asif, Muhammad and Graczyk, Mariusz and Heidari, Babak and Maximov, Ivan}},
  issn         = {{2590-0072}},
  keywords     = {{nanoimprint stamps; UV-curable polymers; nanoimprint lithography; high resolution patterning}},
  language     = {{eng}},
  month        = {{02}},
  publisher    = {{Elsevier}},
  series       = {{Micro and Nano Engineering}},
  title        = {{Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps}},
  url          = {{http://dx.doi.org/10.1016/j.mne.2022.100118}},
  doi          = {{10.1016/j.mne.2022.100118}},
  volume       = {{14}},
  year         = {{2022}},
}