Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps
(2022) In Micro and Nano Engineering 14.- Abstract
- We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off... (More)
- We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/348de17c-bf60-4ff4-b432-5e2322b25609
- author
- Asif, Muhammad
LU
; Graczyk, Mariusz
LU
; Heidari, Babak
and Maximov, Ivan
LU
- organization
- publishing date
- 2022-02-26
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- nanoimprint stamps, UV-curable polymers, nanoimprint lithography, high resolution patterning
- in
- Micro and Nano Engineering
- volume
- 14
- article number
- 100118
- pages
- 7 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:85125490050
- ISSN
- 2590-0072
- DOI
- 10.1016/j.mne.2022.100118
- language
- English
- LU publication?
- yes
- id
- 348de17c-bf60-4ff4-b432-5e2322b25609
- date added to LUP
- 2022-04-06 09:35:08
- date last changed
- 2024-12-06 23:36:21
@article{348de17c-bf60-4ff4-b432-5e2322b25609, abstract = {{We present a systematic comparison of four resins for nanoimprint intermediate polymer stamps, the standard IPS material, OrmoStamp and two new polymers GMN-PS90 (foil) and GMN-PS40 (liquid). The new polymers are based on acrylated silane and offer sufficiently high Young’s modulus and low shrinkage to provide good me chanical stability during the imprint process of well-separated structures. No anti-sticking treatment requires for those new polymers and they can be used at room temperature, which results in better stability of the nano imprint process. The nanoimprint experiments using four resins showed a superior performance of the GMNPS90 material in both single-layer and double-layer imprint process with resolution after lift-off about 30 nm.}}, author = {{Asif, Muhammad and Graczyk, Mariusz and Heidari, Babak and Maximov, Ivan}}, issn = {{2590-0072}}, keywords = {{nanoimprint stamps; UV-curable polymers; nanoimprint lithography; high resolution patterning}}, language = {{eng}}, month = {{02}}, publisher = {{Elsevier}}, series = {{Micro and Nano Engineering}}, title = {{Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps}}, url = {{http://dx.doi.org/10.1016/j.mne.2022.100118}}, doi = {{10.1016/j.mne.2022.100118}}, volume = {{14}}, year = {{2022}}, }