Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

Scanning probe lithography for nanoimprinting mould fabrication

Luo, Gang LU ; Xie, GY ; Zhang, YY ; Zhang, GM ; Zhang, YY ; Carlberg, Patrick LU ; Zhu, T and Liu, ZF (2006) In Nanotechnology 17(12). p.3018-3022
Abstract
We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated... (More)
We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds. (Less)
Please use this url to cite or link to this publication:
author
; ; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Nanotechnology
volume
17
issue
12
pages
3018 - 3022
publisher
IOP Publishing
external identifiers
  • wos:000238256300034
  • scopus:33746599541
ISSN
0957-4484
DOI
10.1088/0957-4484/17/12/034
language
English
LU publication?
yes
id
f2c1fca3-b4f1-473f-a468-0a06ed5b6bca (old id 405920)
date added to LUP
2016-04-01 11:58:36
date last changed
2021-08-04 05:01:12
@article{f2c1fca3-b4f1-473f-a468-0a06ed5b6bca,
  abstract     = {We propose a rational fabrication method for nanoimprinting moulds by scanning probe lithography. By wet chemical etching, different kinds of moulds are realized on Si( 110) and Si( 100) surfaces according to the Si crystalline orientation. The structures have line widths of about 200 nm with a high aspect ratio. By reactive ion etching, moulds with patterns free from the limitation of Si crystalline orientation are also obtained. With closed-loop scan control of a scanning probe microscope, the length of patterned lines is more than 100 mu m by integrating several steps of patterning. The fabrication process is optimized in order to produce a mould pattern with a line width about 10 nm. The structures on the mould are further duplicated into PMMA resists through the nanoimprinting process. The method of combining scanning probe lithography with wet chemical etching or reactive ion etching (RIE) provides a resistless route for the fabrication of nanoimprinting moulds.},
  author       = {Luo, Gang and Xie, GY and Zhang, YY and Zhang, GM and Zhang, YY and Carlberg, Patrick and Zhu, T and Liu, ZF},
  issn         = {0957-4484},
  language     = {eng},
  number       = {12},
  pages        = {3018--3022},
  publisher    = {IOP Publishing},
  series       = {Nanotechnology},
  title        = {Scanning probe lithography for nanoimprinting mould fabrication},
  url          = {http://dx.doi.org/10.1088/0957-4484/17/12/034},
  doi          = {10.1088/0957-4484/17/12/034},
  volume       = {17},
  year         = {2006},
}