Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

Nanoimprint lithography for the fabrication of interdigitated cantilever arrays

Luo, Gang LU ; Maximov, Ivan LU ; Adolph, David LU ; Graczyk, Mariusz LU ; Carlberg, Patrick LU ; Ghatnekar-Nilsson, Sara LU ; Hessman, Dan LU ; Zhu, T ; Liu, Z and Xu, Hongqi LU , et al. (2006) In Nanotechnology 17(8). p.1906-1910
Abstract
We report on the realization of a novel interdigitated cantilever array with electrostatic control of the shape of the interdigitated array. It consists of an array of SiO2/metal double-finger cantilevers in a grating configuration together with an electrical connection part. The complete grating structure is fabricated with nanoimprint lithography, UV lithography and reactive ion etching. The patterns of the cantilever arrays are defined by nanoimprint lithography. The electrical contact pads are defined and aligned with the imprinted grating pattern by UV lithography. The two steps of reactive ion etching are optimized to get vertical sidewalls of the SiO2 cantilevers and finally to release them from the Si substrate. By applying a bias,... (More)
We report on the realization of a novel interdigitated cantilever array with electrostatic control of the shape of the interdigitated array. It consists of an array of SiO2/metal double-finger cantilevers in a grating configuration together with an electrical connection part. The complete grating structure is fabricated with nanoimprint lithography, UV lithography and reactive ion etching. The patterns of the cantilever arrays are defined by nanoimprint lithography. The electrical contact pads are defined and aligned with the imprinted grating pattern by UV lithography. The two steps of reactive ion etching are optimized to get vertical sidewalls of the SiO2 cantilevers and finally to release them from the Si substrate. By applying a bias, the shape of the cantilever array can be altered due to the electrostatic force. The dimensions of the cantilevers and the spacing between them are optimized to achieve the desired functional operating characteristics of the structures. Since the fabrication scheme is based on nanoimprint lithography, such electrostatically controlled periodic structures may be relatively easily and non-expensively realized in various configurations, allowing them to function as optical switching elements, electrical filters, mass sensors, etc. (Less)
Please use this url to cite or link to this publication:
author
; ; ; ; ; ; ; ; and , et al. (More)
; ; ; ; ; ; ; ; ; and (Less)
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Nanotechnology
volume
17
issue
8
pages
1906 - 1910
publisher
IOP Publishing
external identifiers
  • wos:000237813000018
  • scopus:33645291544
ISSN
0957-4484
DOI
10.1088/0957-4484/17/8/017
language
English
LU publication?
yes
id
3c504f58-f5c0-4573-b1d3-298d76700aad (old id 408531)
date added to LUP
2016-04-01 11:41:31
date last changed
2021-09-22 05:14:39
@article{3c504f58-f5c0-4573-b1d3-298d76700aad,
  abstract     = {We report on the realization of a novel interdigitated cantilever array with electrostatic control of the shape of the interdigitated array. It consists of an array of SiO2/metal double-finger cantilevers in a grating configuration together with an electrical connection part. The complete grating structure is fabricated with nanoimprint lithography, UV lithography and reactive ion etching. The patterns of the cantilever arrays are defined by nanoimprint lithography. The electrical contact pads are defined and aligned with the imprinted grating pattern by UV lithography. The two steps of reactive ion etching are optimized to get vertical sidewalls of the SiO2 cantilevers and finally to release them from the Si substrate. By applying a bias, the shape of the cantilever array can be altered due to the electrostatic force. The dimensions of the cantilevers and the spacing between them are optimized to achieve the desired functional operating characteristics of the structures. Since the fabrication scheme is based on nanoimprint lithography, such electrostatically controlled periodic structures may be relatively easily and non-expensively realized in various configurations, allowing them to function as optical switching elements, electrical filters, mass sensors, etc.},
  author       = {Luo, Gang and Maximov, Ivan and Adolph, David and Graczyk, Mariusz and Carlberg, Patrick and Ghatnekar-Nilsson, Sara and Hessman, Dan and Zhu, T and Liu, Z and Xu, Hongqi and Montelius, Lars},
  issn         = {0957-4484},
  language     = {eng},
  number       = {8},
  pages        = {1906--1910},
  publisher    = {IOP Publishing},
  series       = {Nanotechnology},
  title        = {Nanoimprint lithography for the fabrication of interdigitated cantilever arrays},
  url          = {http://dx.doi.org/10.1088/0957-4484/17/8/017},
  doi          = {10.1088/0957-4484/17/8/017},
  volume       = {17},
  year         = {2006},
}