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Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application

Olsson, Maryam LU ; Macak, Karol and Graf, Wolfgang (1999) In Surface & Coatings Technology 122(2-3). p.202-207
Abstract
Stoichiometric Al2O3 films are produced with a pure Al source in the metallic state in an O2+Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-to-substrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.
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author
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Al2O3, Large area coatings, Reactive d.c. magnetron sputtering
in
Surface & Coatings Technology
volume
122
issue
2-3
pages
202 - 207
publisher
Elsevier
external identifiers
  • scopus:0012812949
ISSN
0257-8972
DOI
10.1016/S0257-8972(99)00378-3
language
English
LU publication?
no
id
0973b37f-a1f1-434c-a235-40c652b5f2b9 (old id 4645083)
date added to LUP
2014-09-10 08:02:18
date last changed
2017-02-26 04:17:41
@article{0973b37f-a1f1-434c-a235-40c652b5f2b9,
  abstract     = {Stoichiometric Al2O3 films are produced with a pure Al source in the metallic state in an O2+Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-to-substrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.},
  author       = {Olsson, Maryam and Macak, Karol and Graf, Wolfgang},
  issn         = {0257-8972},
  keyword      = {Al2O3,Large area coatings,Reactive d.c. magnetron sputtering},
  language     = {eng},
  number       = {2-3},
  pages        = {202--207},
  publisher    = {Elsevier},
  series       = {Surface & Coatings Technology},
  title        = {Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application},
  url          = {http://dx.doi.org/10.1016/S0257-8972(99)00378-3},
  volume       = {122},
  year         = {1999},
}